Zobrazeno 1 - 2
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pro vyhledávání: '"T. T. Foxe"'
Publikováno v:
Journal of Vacuum Science and Technology. 19:1394-1397
The reactive gases CBrF3 and CF4 have both been found to be effective in the reactive ion etching of niobium. At relatively high pressures, 100 mTorr, rapid etching with a small degree of undercutting occurs at moderate rf power levels. At lower pres
Publikováno v:
Physical Review Letters. 43:169-172