Zobrazeno 1 - 10
of 809
pro vyhledávání: '"T. Schedel"'
Autor:
Chae SY; Department of Energy System Research, Ajou University, Suwon, 16499, Republic of Korea.; Ajou Energy Science Research Center, Ajou University, Suwon, 16499, Republic of Korea., Jun M; Hydrogen·Fuel Cell Research Center, Korea Institute of Science and Technology, Seoul, 02792, Republic of Korea., Yoon N; Clean Energy Research Center, Korea Institute of Science and Technology, Seoul, 02792, Republic of Korea.; Department of Chemical and Biomolecular Engineering, Yonsei University, Seoul, 03722, Republic of Korea., Joo OS; Clean Energy Research Center, Korea Institute of Science and Technology, Seoul, 02792, Republic of Korea., Kim JY; Hydrogen·Fuel Cell Research Center, Korea Institute of Science and Technology, Seoul, 02792, Republic of Korea., Park ED; Department of Energy System Research, Ajou University, Suwon, 16499, Republic of Korea.; Department of Chemical Engineering, Ajou University, Suwon, 16499, Republic of Korea.
Publikováno v:
Small (Weinheim an der Bergstrasse, Germany) [Small] 2024 Sep 09, pp. e2405048. Date of Electronic Publication: 2024 Sep 09.
Autor:
X. Cai, R. Ghaskadavi, T. Schedel, R. Cantrell, P. Nesladek, Chris Clifford, M. Bender, R. Moses, Pawitter Mangat, Uzodinma Okoroanyanwu, E. Mohn, X. Zhu, H. Rolff, Jeffrey A. Schefske, N. Schmidt, Licausi Nicholas, W. Taylor, Obert Wood, J. Heumann, Fan Jiang
Publikováno v:
SPIE Proceedings.
Pending the availability of actinic inspection tools, optical inspection tools with 193 nm DUV illumination wavelength are currently used to inspect EUV masks and EUVL-exposed wafers. Due to strong optical absorption, DUV photons can penetrate only a
Autor:
F. Atamny, M. Keil, T. Schedel-Niedrig, J. Bloecker, A. M. Bradshaw, B. Henschke, R. Schloegl
Publikováno v:
The Journal of Physical Chemistry. 96:4522-4526
The reaction of molecular oxygen at 1000 K with the (001) face of highly oriented pyrolytic graphite (HOPG) has been studied by X-ray absorption spectroscopy (XAS). At 10% weight loss the reaction produces additional defects but leaves the overall el
Autor:
R. Schuster, T. Schedel, L. Grant, G. Hraschan, A. Charles, J. Maltabes, D. Ganz, S. Schmidt, S. Hornig, R. Otto, T. Metzdorf
Publikováno v:
1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314).
This paper discusses the performance of the initial 300 mm lithography tool set installed in a pilot line in Dresden, Germany. The product used for evaluating and debugging the tool set is a 0.25-micron ground rule 64 M DRAM. This was chosen for the
Autor:
T. Schedel, D. Ganz, A. Charles, R. Schuster, W. Koestler, J. Maltabes, S. Schmidt, K. Mautz, G. Hraschan, S. Hornig
Publikováno v:
Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130).
We study the performance of the current 300mm lithography tool set for sub 0.2 /spl mu/m processes. The results are discussed in terms of process capability and stability. It was determined that the non-linear errors which are much higher on 300 mm w
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Autor:
Harks, Tobias1 (AUTHOR), Schedel, Anja1 (AUTHOR) anja.schedel@math.uni-augsburg.de
Publikováno v:
Mathematical Programming. Jan2024, Vol. 203 Issue 1/2, p763-799. 37p.
Publikováno v:
Acta Physica Polonica: A. Oct2023, Vol. 144 Issue 4, p247-254. 8p.
Publikováno v:
Surface Science Letters. :A371
The adsorption of benzene on Ni(110) provides an example of benzene in a significantly crowded surface configuration. This is shown from studies with angle resolved photoemission, near-edge X ray absorption fine structure, LEED and thermal desorption