Zobrazeno 1 - 10
of 30
pro vyhledávání: '"T. Prokofyeva"'
Publikováno v:
International Journal of Modern Physics B. 25:1459-1466
Photoelectric properties of neutron transmutation doped (NTD) Si 1-x Ge x solid solutions (alloy) with variable composition are presented. It is shown that the application of NTD method to Si 1-x Ge x solid solutions with gradient composition (x = 0
Autor:
G. Kipshidze, Vladimir Kuryatkov, Sergey A. Nikishin, Henryk Temkin, Andrey Zubrilov, T. Prokofyeva, Mark Holtz
Publikováno v:
Journal of Applied Physics. 91:1209-1212
We report a study of the optical properties of GaN grown on Si(111) by gas source molecular beam epitaxy with ammonia. Temperature dependence of edge luminescence was studied in the range of 77–495 K for samples with low background carrier concentr
Autor:
K. Choi, Iu. Gherasoiu, Karl D. Hobart, Sergey A. Nikishin, T. Prokofyeva, Mohammad Fatemi, Vladimir Kuryatkov, Fritz J. Kub, Mark Holtz, G. Kipshidze, Henryk Temkin
Publikováno v:
Journal of Electronic Materials. 30:825-828
Epitaxial layers of AlN and GaN were grown by gas source molecular-beam epitaxy on a composite substrate consisting of a thin (250 nm) layer of silicon (111) bonded to a polycrystalline SiC substrate. Two dimensional growth modes of AlN and GaN were
Autor:
S. Williams, T. Prokofyeva, K. Copeland, Mark Holtz, V. Tretyakov, M. Seon, J. Vanbuskirk, Sergey A. Nikishin, Henryk Temkin
Publikováno v:
Journal of Applied Physics. 89:7977-7982
We report optical studies on AlxGa1−xN alloy layers across the full composition range. The series of alloy layers was grown on (111)-oriented silicon substrates using gas-source molecular beam epitaxy. From reflectance measurements, we determine th
Autor:
Vyacheslav A. Elyukhin, Mark Holtz, A. S. Zubrilov, Vladimir Dmitriev, S. N. G. Chu, Henryk Temkin, V. G. Antipov, Irina P. Nikitina, Luis Grave de Peralta, N. N. Faleev, S. Francoeur, Andrei Nikolaev, T. Prokofyeva, G. A. Seryogin, Yuriy Melnik, Sergey A. Nikishin
Publikováno v:
MRS Internet Journal of Nitride Semiconductor Research. 5:467-473
We describe the growth of high quality AlN and GaN on Si(111) by gas source molecular beam epitaxy (GSMBE) with ammonia (NH3). The initial nucleation (at 1130−1190K) of an AlN monolayer with full substrate coverage resulted in a very rapid transiti
Autor:
J.W. Harris, D.L. Adams, N. Added, S. Ahmad, S.A. Akimenko, B.D. Anderson, G.T. Anderson, R.M. Anjos, A. Aprahamian, Yu.I. Arestov, E. Atkin, A. Baldwin, V. Baublis, M.E. Beddo, N.I. Belikov, R. Bellwied, V.I. Belousov, S. Bennett, J. Bercovitz, I. Bertram, J. Bielecki, F. Bieser, N.N. Biswas, M.A. Bloomer, B.E. Bonner, P.P. Brady, W.J. Braithwaite, L. Braun, J.A. Buchanan, N. Carlin, J.B. Carroll, D.A. Cebra, A.D. Chacon, C.S. Chan, K-S. Chan, S.I. Chase, M.G. Cherney, R.K. Choudhury, W. Christie, B.V. Chujko, J.M. Clement, M.D. Corcoran, T.M. Cormier, J.G. Cramer, H.J. Crawford, A.M. Davidenko, J.W. Dawson, R. Debbe, A.A. Derevschikov, P.A. De Young, W. Dominik, L. Dou, J.E. Drape, I. Duck, W.R. Edwards, S.E. Eiseman, J.M. Engelage, S.V. Erin, A. Etkin, D. Ferenc, I. Flores, K.J. Foley, Z. Fraenkel, A. French, E. Friedlander, D. Fritz, U. Garg, M. Gazdzicki, V. Ghazikhanian, G. Glass, W. Gong, O.A. Grachov, J. Grebiezkow, D. Greiner, L.C. Greiner, E. Grimson, D.P. Grosnick, V. Grushin, V.J. Guarino, W.N. Haberichter, R.W. Hackenburg, J. Hall, T.J. Hallman, W.E. Hearn, D.A. Hill, N. Hill, A.S. Hirsch, E. Hjort, G.W. Hoffmann, H. Huang, T.J. Humanic, G.J. Igo, P.M. Jacobs, R. Jayanti, P.G. Jones, E. Judd, M.L. Justice, K. Kadija, M. Kaplan, P.J. Karol, T. Kasprzyk, D. Keane, V.P. Kenney, A. Khodinov, S.A. Kleinfelder, A.S. Konstantinov, D. Kostin, I. Kotov, V. Kozlov, M.A. Kramer, V. Kuryatkov, R.L. LaPierre, B. Lasiuk, A. Lebedev, M.J. Le Vine, Q. Li, S.J. Lindenbaum, V. Lindenstruth, P.J. Lindstrom, A. Ljubicic, W.J. Llope, R.S. Longacre, D.X. Lopiano, W.A. Love, L. Madansky, S. Margetis, J. Marx, H.S. Matis, Yu.A. Matulenko, C.P. McParland, T.S. McShane, A.P. Meschanin, Z. Milosevich, N. Miphtakhov, K. Mirk, J. Mitchell, J.L. Mitchell, C.F. Moore, S. Mordechai, R. Morse, J. Murgatroyd, G.S. Mutchler, A.I. Mysnick, J. Nasiatka, C.J. Naudet, A. Nazarov, V. Nevolin, T.L. Noggle, S. Novikov, S.B. Nurushev, G. Odyniec, C. Ogilvie, D.L. Olson, A. Oltchak, E. Onishenko, E. Paganis, G. Paic, A.I. Pavlinov, T. Pawlak, W. Peryt, E. Petereit, E.D. Platner, J. Pluta, A.Yu. Polyarush, N.T. Porile, A.M. Poskanzer, D. Prindle, T. Prokofyeva, C. Pruneau, G. Rai, J. Rasson, R.L. Ray, D. Read, R.E. Renfordt, P.J. Riley, H-G. Ritter, J.B. Roberts, D. Roehrich, G. Roger, A.A. Rollefson, J.L. Romero, A.I. Ronzhin, V.L. Rykov, I. Sakrejda, A.C. Saulys, J.J. Schambach, R.P. Scharenberg, L.S. Schroeder, J.E. Seger, V.A. Sergeev, D. Seymour, A. Shalnov, Y.P. Shao, J. Sheen, K.E. Shestermanov, D. Shuman, A. Simakov, L.F. Soloviev, H.M. Spinka, B.K. Srivastava, R. Stock, R. Stone, M. Strikhanov, B. Stringfellow, H. Stroebele, A.T. Sustich, T.J.M. Symons, E.M. Szanto, A.Szanto de Toledo, Yu. Sytsko, J.-L. Tang, S. Tarakanov, M.L. Tincknell, M. Toy, T.A. Trainor, S. Trentalange, O.D. Tsay, I. Tserruya, A.G. Ufimtsev, D.G. Underwood, A. Vander Molen, A. Vanyashin, A.N. Vasiliev, G. Vilkelis, Yu. Volkov, S. Voloshin, D. Vranic, H.J. Ward, J.W. Watson, R.C. Welsh, S. Wenig, G. Westfall, J. Whitfield, C.A. Whitten, H. Wieman, K. Wilson, D.C. Wold, K.L. Wolf, P. Yepes, A. Yokosawa, W. Zhang, K.H. Zhao, X.-Z. Zhu, Y. Zhu, V.E. Zyrin
Publikováno v:
Publons
Publikováno v:
Applied Physics Letters. 76:1842-1844
We demonstrate selective growth of high-quality GaN by gas-source molecular beam epitaxy on Si(111) wafers patterned with SiO2. GaN was grown on wafers having two different buffer layers. The first buffer layer contains two AlGaN/GaN superlattices, s
Autor:
Mark Holtz, M. Seon, Theodore D. Moustakas, T. Prokofyeva, R. Singh, Henryk Temkin, Ferdynand P. Dabkowski
Publikováno v:
Applied Physics Letters. 75:1757-1759
We use Raman scattering to obtain a stress map of lateral epitaxy overgrown GaN. Isolated hexagonal islands are grown by selective area overgrowth without a seed layer. Stress mapping is obtained from shifts in the E2 phonon. GaN in the aperture area
Autor:
Henryk Temkin, G. A. Seryogin, Sebastien Francoeur, Sergey A. Nikishin, V. G. Antipov, Stefan Zollner, A. Konkar, Mark Holtz, T. Prokofyeva, V. A. Elyukhin, N. N. Faleev
Publikováno v:
Scopus-Elsevier
Hexagonal AlN layers were grown on Si(111) by gas-source molecular-beam epitaxy with ammonia. The transition between the (7×7) and (1×1) silicon surface reconstructions, at 1100 K, was used for in situ calibration of the substrate temperature. The
Publikováno v:
Applied Physics Letters. 73:1409-1411
We report direct-backscattering Raman studies of GaAs1−xNx alloys, for x⩽0.03, grown on (001) GaAs. The Raman spectra exhibit a two-mode behavior. The allowed GaAs-like longitudinal-optic phonon near 292 cm−1 is found to red shift at a rate of