Zobrazeno 1 - 10
of 38
pro vyhledávání: '"T. Lagarde"'
Publikováno v:
Plasma Sources Science and Technology. 11:407-412
The scaling up of conventional distributed electron cyclotron resonance plasmas presents limitations in terms of plasma density, limited to the critical density, and of uniformity, due to the difficulty of achieving constant amplitude standing wave p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::188031cb951d90f8b2fb8008427fffd4
https://doi.org/10.1088/0963-0252/11/4/307
https://doi.org/10.1088/0963-0252/11/4/307
Autor:
Mathieu Bernard, J. Pelletier, T. Lagarde, Etienne Gheeraert, Pierre Muret, Alain Deneuville, E. Treboux, N. Casanova
Publikováno v:
Diamond and Related Materials. 11:828-832
Simultaneous etching of NID, lightly boron-doped, phosphorus-doped homoepitaxial CVD films and Ib HPHT crystal was achieved at RT in a home-made reactor producing O2 ECR plasma which was homogeneous on approximately 200 cm−2. Etching rates varying
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::579ef37a303aba8b1c5ef98552c1f880
https://doi.org/10.1016/s0925-9635(01)00563-5
https://doi.org/10.1016/s0925-9635(01)00563-5
Publikováno v:
Surface and Coatings Technology. 139:222-232
After a brief review of the plasma production and diffusion mechanisms above multipolar magnetic field structures, the possible means of sustaining magnetron discharges are listed. In particular, various designs of distributed electron cyclotron reso
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6c1ede6c3848efb396906f6b42541ac2
https://doi.org/10.1016/s0257-8972(01)01020-9
https://doi.org/10.1016/s0257-8972(01)01020-9
Publikováno v:
Plasma Sources Science and Technology. 10:181-190
In order to better understand the mechanisms of plasma production above multipolar magnetic fields via electron cyclotron resonance, the electron energy distribution function (EEDF) of an argon plasma in the magnetic field of a planar magnetron-like
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e95cd52ef4a0aca6b8a4e0926d59148e
https://doi.org/10.1088/0963-0252/10/2/308
https://doi.org/10.1088/0963-0252/10/2/308
Publikováno v:
Le Journal de Physique IV. :Pr7-121
Dans les sources plasma a resonance cyclotronique electronique repartie (RECR), l'acceleration des electrons est produite par un champ electrique microonde, applique et reparti sur des structures magnetiques multipolaires, capables de fournir le long
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::02ea87af37887013aac057b60ed7df7d
https://doi.org/10.1051/jp4:1998710
https://doi.org/10.1051/jp4:1998710
Publikováno v:
Review of Scientific Instruments. 69:831-836
Plasma-based ion implantation (PBII) is a recent method to implant ions into materials for modifying surface properties. Negative high voltage pulses are applied to the substrate to extract ions from the plasma and accelerate them directly onto the s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::063651fbd54a887d3a9661191ea7a2bf
https://doi.org/10.1063/1.1148530
https://doi.org/10.1063/1.1148530
Publikováno v:
Plasma Sources Science and Technology. 6:386-393
In argon plasmas excited at electron cyclotron resonance above multipolar magnetic field structures, ion density increases linearly with microwave input power but saturates as it gets near the critical density. This behaviour is observed at the three
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::07de21dd87c629dfed63ff192177ad01
https://doi.org/10.1088/0963-0252/6/3/015
https://doi.org/10.1088/0963-0252/6/3/015
Publikováno v:
Plasma Sources Science and Technology. 6:53-60
In distributed electron cyclotron resonance plasma sources, the acceleration of electrons is produced by microwave electric fields, applied and distributed close to a multipolar magnetic field structure, providing along the magnets the condition for
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::43a7ca9ac8cfdf6a853a67461a0c04af
https://doi.org/10.1088/0963-0252/6/1/008
https://doi.org/10.1088/0963-0252/6/1/008
Publikováno v:
Thin Solid Films. 270:49-54
Thin near-stoichiometric silica films were deposited by plasma-enhanced chemical vapour deposition (PECVD) using pure SiH4 and O2 in a planar plasma reactor based on the proprietary uniform distributed electron cyclotron resonance (UDECR) technology.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e55221a30d643790c947f077e506dbca
https://doi.org/10.1016/0040-6090(96)80068-x
https://doi.org/10.1016/0040-6090(96)80068-x
Publikováno v:
Surface and Coatings Technology. :770-775
Multipolar magnetic fields, used for the production of large areas of low pressure, high density plasmas at electron cyclotron resonance, can also be employed favourably to scale-up plasma sources at any given excitation frequency. Since fast electro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::94d8a0ccd72c4f9ca8ab949d7a64a1de
https://doi.org/10.1016/0257-8972(95)02609-6
https://doi.org/10.1016/0257-8972(95)02609-6