Zobrazeno 1 - 1
of 1
pro vyhledávání: '"T. J. Mulrooney"'
Autor:
M. G. R. Thomson, R. Liu, D. P. Rosenfeld, D. E. A. Smith, E. A. Gere, C. M. Rose, T. J. Mulrooney, D. S. Alles, N. Paras, R. J. Nielsen, F. Leone, C. J. Biddick, J. T. Clemens, L. R. Harriott, R. M. Richman, R. J. Collier, J. H. Bruning
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 5:47
EBES4 is an electron‐beam exposure machine designed for accurate submicron lithography with good throughput. It can write on optical and x‐ray mask substrates and directly on semiconductor substrates. Standard pattern data are preprocessed using
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0eea6a3180f3cea2adc17a17fa9b8e23
https://doi.org/10.1116/1.583925
https://doi.org/10.1116/1.583925
