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pro vyhledávání: '"T. Hurkmans"'
Publikováno v:
ECS Meeting Abstracts. :1112-1112
Akademický článek
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Autor:
Christian G.C. Strondl, T. Hurkmans, T. Trinh, G.J. van der Kolk, J.Th.M. De Hosson, N.J.M. Carvalho, W. Fleischer
Publikováno v:
Surface and Coatings Technology, 142-144, 707-713. Elsevier Science
Metal containing diamond-like carbon (Me-DLC) coatings are widely applied in industrial applications. Normally, the coatings are produced with small inclusions of carbide forming elements like the 3d, 4d or 5d metals, or Si or B. The small carbide is
Publikováno v:
Surface and Coatings Technology. 114:101-107
Current deposition equipment has been designed largely as a compromise between the emission characteristics of the vapour sources and the shape and quantities of the parts to be coated. Conditioning equipment was then added to adapt the equipment to
Autor:
Ivan Petrov, Daniel B. Bergstrom, T. Trinh, T. Hurkmans, P. Losbichler, Joseph E Greene, Wolf-Dieter Münz
Publikováno v:
Scopus-Elsevier
The microstructure and microchemistry of polycrystalline Ti1−x−yAlxNbyN alloys and Ti1−xAlxN/Ti1−yNbyN multilayers grown on bee ferritic stainless steel substrates at 450 °C by unbalanced-magnetron (UBM) sputter deposition and combined UBM/c
Publikováno v:
Surface and Coatings Technology. 92:62-68
Combined arc/unbalanced magnetron (ABS™) PVD hard coating technology has been available to the hard coating market for five years with the industrial coating system HTC-1000-ABS-MK I. Besides an improved HTC-1000-ABS-MK II version the HTC-1500-ABS
Publikováno v:
Surface and Coatings Technology. :192-199
Increasingly chromium nitride coatings are being used as a replacement for electroplated hard chromium in various applications. This paper reports an investigation of chromium nitride coatings deposited at 250°C on various substrates at different N2
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 14:2247-2250
This article reports on the sputtering of pure Ti and Ti‐based alloy films onto substrates where the temperature Ts was kept below 100 °C, using the magnetron sputter ion plating process. It was found that while the pure Ti film is a hexagonal low
Publikováno v:
Surface and Coatings Technology. :159-166
This paper reports the deposition of TiN-W2N superlattice coatings using unbalance magnetron sputter deposition. Three magnetrons were used to vaporise the poisoning sensitive material titanium whereas only one magnetron was needed to deposit suffici
Publikováno v:
Vacuum. 46:323-330
During the cathodic arc enhanced metal ion etching process of steel substrates droplets are generated on the cathode which deposit on the substrate surface. The concentration of the droplets obviously depends upon the melting point of the target mate