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Publikováno v:
Journal of Crystal Growth. 234:184-189
In the frame of a research project aimed at obtaining high-resistivity CdTe crystals, the authors report on the preparation of (nominally) undoped semi-insulating (SI) CdTe crystals. The method is based on the use of polycrystalline CdTe charges synt
Publikováno v:
Journal of Crystal Growth. :14-18
In the frame of a research project aimed at preparing high-resistivity CdTe single crystals, the authors have developed as a first step, a new, low cost, fast technique which allows to synthesize from the elements polycrystalline CdTe with very low s
Publikováno v:
Materials Science Forum. 203:7-12
Publikováno v:
Materials Science and Engineering: B. 28:488-492
InP surfaces, with (100), (111)In and (111)P orientations were etched with HBr-K2Cr2O7-H2O (BCA) solutions. Etching could be diffusion controlled (giving rise to polishing) or purely kinetically controlled (revealing crystallographic defects), depend
Publikováno v:
Journal of Crystal Growth. 141:57-67
InP surfaces with (100), (111)In and (111)P orientations were etched with HBr-K 2 Cr 2 O 2 -H 2 O solutions. Etching could be diffusion-controlled (giving rise to polishing) or purely kinetically controlled (revealing crystallographic defects), depen
Publikováno v:
Journal of Applied Physics. 75:2406-2409
The phosphorus pressure in equilibrium with solid InP heated at temperatures of up to 980 °C was measured using a new‐concept apparatus appositely designed and manufactured. With this apparatus, all the difficulties inherent to handling of phospho
Publikováno v:
Acta Physica Hungarica. 70:231-236
From the technological point of view the main task is to achieve a regular shape, good crystallographical and electrical parameters in the crystal growth process. The GaAs single crystals grown by the technology of Liquid Encapsulated Czochralski (LE
Publikováno v:
Scopus-Elsevier
A study on the uniformity of Fe-diffused semi-insulating InP wafers is presented. The electrical characterisation showed that after the diffusion annealing the wafers became semi-insulating, with resistivities generally above 10/sup 8/ /spl Omega/ cm
Publikováno v:
Acta Physica Hungarica. 61:149-152
Multilayer LPE of GaAs and GaAlAs using a vertical system with rotary graphite crucible has been developed. Using this equipment superlattice structures in the GaAs-GaAlAs system were grown. The layer thicknesses were varied from 20 to 500 nm. Struct