Zobrazeno 1 - 3
of 3
pro vyhledávání: '"T. E. Novelo"'
Publikováno v:
Journal of Nanomaterials, Vol 2017 (2017)
This work describes the analysis of morphology and electrical resistivity (ρ) obtained in the Au/Cu/Si system. The Au/Cu bilayers were deposited by thermal evaporation technique with thicknesses from 50 to 250 nm on SiOx/Si(100) substrates. The Au :
Publikováno v:
Materials Characterization. 101:83-89
Au/Cu bilayers with different Au:Cu concentrations (25:75, 50:50 and 75:25 at.%) were deposited on Si(100) substrates by thermal evaporation. The thicknesses of all Au/Cu bilayers were 150 nm. The alloys were prepared by thermal diffusion into a vacu
Publikováno v:
Boletín de la Sociedad Española de Cerámica y Vidrio. 43:801-804
In this work a simple method for monitoring the low temperature oxidation of aluminum thin films, which is based on measurements of electrical resistance using the four-probe technique, is proposed. Kinetic growth data of the aluminum oxide layer, ob