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pro vyhledávání: '"T. Dupraz"'
Publikováno v:
2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
As technology nodes become smaller it is getting more important to control all aspects of influencing parameters on the deposition of thin films using a CVD process. It is well known that physical parameters like gas flow or temperature heavily influ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::11a6fa4b34c7773a776faffaef672cb7
https://doi.org/10.1109/asmc.2017.7969219
https://doi.org/10.1109/asmc.2017.7969219
