Zobrazeno 1 - 10
of 28
pro vyhledávání: '"T. Berthou"'
Autor:
Noemí Pérez, Ainara Rodriguez, Santiago M. Olaizola, Zuobin Wang, Mikel Echeverría, Joan Savall, T. Berthou, I. Ayerdi, Miguel Ellman, Yuri K. Verevkin, Changsi Peng
Publikováno v:
Microelectronic Engineering. 86:937-940
Periodic structures are of increasing interest in many fields such as nanotechnology and biotechnology among others. Laser Interference Lithography (LIL) has been widely studied for the fabrication of periodic structures. However, a LIL tool for the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3094dbf6f42474e2ccbc5a0eecfe9952
https://doi.org/10.1016/j.mee.2008.12.043
https://doi.org/10.1016/j.mee.2008.12.043
Autor:
Ainara Rodriguez, Santiago M. Olaizola, Miguel Ellman, Mikel Echeverría, Changsi Peng, I. Ayerdi, Noemí Pérez, T. Berthou, Yury K. Verevkin, Zuobin Wang
Publikováno v:
Applied Surface Science. 255:5537-5541
High throughput and low cost fabrication techniques in the sub-micrometer scale are attractive for the industry. Laser interference lithography (LIL) is a promising technique that can produce one, two and three-dimensional periodical patterns over la
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b07def3fff53f8ebf779024419d02d48
https://doi.org/10.1016/j.apsusc.2008.07.201
https://doi.org/10.1016/j.apsusc.2008.07.201
Akademický článek
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Autor:
Chunlei Tan, Yury K. Verevkin, Changsi Peng, Santiago M. Olaizola, Ze Ji, S Tisserand, Jin Zhang, T. Berthou, Zuobin Wang
Publikováno v:
2009 International Conference on Mechatronics and Automation.
This paper introduces the quality inspection of nanoscale patterns produced by the Laser Interference Lithography (LIL) technology using image analysis techniques. In this paper, patterns of two-beam and four-beam interferences are considered. Image
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8595ad0dfe50088b168c57924d7aa1f2
https://doi.org/10.1109/icma.2009.5246458
https://doi.org/10.1109/icma.2009.5246458
Autor:
Miguel Ellman, Noemí Pérez, Changsi Peng, Zuobin Wang, I. Ayerdi, Ainara Rodriguez, Ze Ji, Santiago M. Olaizola, Yury K. Verevkin, Jin Zhang, T. Berthou
Publikováno v:
SPIE Proceedings.
Laser interference lithography (LIL) is concerned with the use of interference patterns generated from two or several coherent beams of laser radiation for the structuring of materials. This paper presents the work on the processes based on resists a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0374117fb664505c338c2040d813405b
https://doi.org/10.1117/12.808834
https://doi.org/10.1117/12.808834
Autor:
Sophie Gautier, Lionel Dupuy, David Grojo, T. Berthou, Mohammed Laraichi, Philippe Delaporte, Stephane Tisserand, Danaë Delbeke, Peter Muys, Fabien Reversat
Publikováno v:
Micro-Optics 2008.
The unavoidable absorption of thin films used in antireflective coatings forms a permanent bottleneck in the development of optics for high power laser applications. A valid alternative would be the micro-structuring of the optics surface, realizing
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8e254353200433113d32208d32e90a9f
https://doi.org/10.1117/12.782633
https://doi.org/10.1117/12.782633
Autor:
Zuobin Wang, Changsi Peng, Yury K. Verevkin, T. Berthou, Chunlei Tan, Ainara Rodriguez, Jin Zhang, Santiago M. Olaizola, I. Ayerdi, S Tisserand
Publikováno v:
2007 International Conference on Mechatronics and Automation.
This paper presents a system requirement analysis of multi-beam laser interference nanolithography for nanoscale structuring of materials including seven sections: introduction, formation of multi-beam laser interference patterns, user requirements,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7b31def65e08edcb8d52c1fd07180bf2
https://doi.org/10.1109/icma.2007.4303582
https://doi.org/10.1109/icma.2007.4303582
Autor:
S Tisserand, Yury K. Verevkin, Ze Ji, Zuobin Wang, Eric Y. Daume, Ainara Rodriguez, Santiago M. Olaizola, Changsi Peng, Chunlei Tan, Jin Zhang, T. Berthou
Publikováno v:
SPIE Proceedings.
This paper presents a theoretical analysis of formation of 4-beam laser interference patterns for nanolithography. Parameters of 4-beam interference patterns including the pattern amplitude, period, orientation and uniformity were discussed. Analytic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::421118607c4be9be08108239146adc85
https://doi.org/10.1117/12.723782
https://doi.org/10.1117/12.723782
Autor:
M. Pessa, Santiago M. Olaizola, V N Petryakov, Changsi Peng, Chunlei Tan, T. Berthou, S Tisserand, Yu K Verevkin, Jin Zhang, Janne Pakarinen, Zuobin Wang
Publikováno v:
Nanotechnology. 20:125303
We present a simplified method to employ laser interference lithography for the fabrication of ordered nanostructures. Neither resist, nor an elaborate fabrication process was needed. Four-beam interference patterns generated in this work included pe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f7c3bb6b6f9e790abcd87a43933e9067
https://doi.org/10.1088/0957-4484/20/12/125303
https://doi.org/10.1088/0957-4484/20/12/125303