Zobrazeno 1 - 7
of 7
pro vyhledávání: '"T R Dietrich"'
Publikováno v:
JALA: Journal of the Association for Laboratory Automation. 6:45-49
Mikroglas is a young, innovative and highly-specialized enterprise, which has special know-how in the development of microstructured glass components. Due to its unique properties, glass plays an important role in the field of microtechnology. Most i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::267c63bddb7830084fac0b1c17e2b939
https://doi.org/10.1016/s1535-5535-04-00143-1
https://doi.org/10.1016/s1535-5535-04-00143-1
Publikováno v:
Journal of Micromechanics and Microengineering. 6:254-260
A new variety of ultra-long tips for atomic force microscopy has been fabricated using photoetchable glass. Photoetchable glass is structured by UV exposure through a quartz mask followed by a heat treatment and etch process in hydrofluoric acid. The
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fbd228d4f82956f2becd4b6f17c34b71
https://doi.org/10.1088/0960-1317/6/2/007
https://doi.org/10.1088/0960-1317/6/2/007
Publikováno v:
Microelectronic Engineering. 30:497-504
Photoetchable glass is a very promising material for the production of components for a wide variety of microsystems. High aspect ratio microstructures can be realized by using slightly modified semiconductor equipment and relatively low fabrication
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::29a625f85eb4e8cf0d5a0fd3973da5bd
https://doi.org/10.1016/0167-9317(95)00295-2
https://doi.org/10.1016/0167-9317(95)00295-2
Publikováno v:
Journal of Micromechanics and Microengineering. 3:187-189
The authors present the use of photoetchable glasses in the field of microsystem technology. Its properties make it an ideal material for a wide variety of microsystems. A method to fabricate tips for atomic force microscopy out of this material is p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::31479309db9e7295ae42869ed19359ee
https://doi.org/10.1088/0960-1317/3/4/004
https://doi.org/10.1088/0960-1317/3/4/004
Publikováno v:
Chemical Engineering & Technology; Apr2005, Vol. 28 Issue 4, p477-483, 7p
Publikováno v:
Scopus-Elsevier
The following work gives a discussion on hydrogenated amorphous silicon (a-Si:H) film preparation by laser induced chemical vapor deposition (LICVD) using a pulsed CO2-laser in a parallel configuration. Deposition rate and initiation of polymerizatio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bba19dfcbdf927cbe2ccff238a0d55f9
http://www.scopus.com/inward/record.url?eid=2-s2.0-0025496135&partnerID=MN8TOARS
http://www.scopus.com/inward/record.url?eid=2-s2.0-0025496135&partnerID=MN8TOARS
Publikováno v:
Scopus-Elsevier
ArF laser-induced CVD has been employed to generate hydrogenated amorphous silicon (a-Si:H) from Si2H6 gas dilute with He, Ar, or H2. The formation of amorphous films or powder is found to depend critically on the kind of buffer gas, the stationary t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b52e44a4b1b80469c49f9c823dc82bcf
http://www.scopus.com/inward/record.url?eid=2-s2.0-0024656477&partnerID=MN8TOARS
http://www.scopus.com/inward/record.url?eid=2-s2.0-0024656477&partnerID=MN8TOARS