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Influence of the Ti Content on the Electrochemical Performance and Surface Properties of (La0.6Sr0.4)0.99Co1− xTixO3− δ Oxygen Electrode

Autor: Kuno Kooser, Gunnar Nurk, T. Käämbre, Jaan Aruväli, Prit Moeller, Indrek Kivi, Alar Heinsaar, Enn Lust

Publikováno v: ECS Transactions. 103:1433-1444

Mixed ionic and electronic conducting (MIEC) oxides are being used as solid oxide fuel cell (SOFC) electrode materials [1, 2]. La1− xSrxCoO3− δ (LSC) oxygen electrode has perovskite-type (ABO3) structure. The properties of these materials are de

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::aa823f4ed73c043aa244dd074a28a490
https://doi.org/10.1149/10301.1433ecst

A new user-friendly materials science end station at the FinEstBeAMS beamline of MAX IV

Autor: W Wang, A Kivimäki, K Chernenko, R Pärna, T Käämbre, E Kukk, K Kokko, M Valden, M Hirsimäki, M Kirm, M Huttula

Publikováno v: Journal of Physics: Conference Series. 2380:012048

FinEstBeAMS is an atmospheric and materials science beamline located at the 1.5 GeV storage ring of the MAX IV Laboratory in Lund, Sweden. It offers a very wide photon energy range 4.5-1300 eV and radiation with different polarization characteristics

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::675763e7efe7ea2e39ce9468f5d4a29a
https://doi.org/10.1088/1742-6596/2380/1/012048

Hafnium oxide/graphene/hafnium oxide-stacked nanostructures as resistive switching media

Autor: Aarne Kasikov, Taivo Jõgiaas, Aivar Tarre, Salvador Dueñas Carazo, Jekaterina Kozlova, T. Käämbre, María Helena Castán Lanaspa, Kaupo Kukli, Helle-Mai Piirsoo, Guillermo Vinuesa Sanz, Tauno Kahro, Peeter Ritslaid, Aile Tamm

Publikováno v: UVaDOC. Repositorio Documental de la Universidad de Valladolid
instname
UVaDOC: Repositorio Documental de la Universidad de Valladolid
Universidad de Valladolid

Producción Científica
Thin HfO2 films were grown by atomic layer deposition on chemical vapor-deposited large-area graphene. The graphene was transferred, prior to the deposition of the HfO2 overlayer, to the HfO2 bottom dielectric layer pregr

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::261de93b35baa23df4dbeb075fff4e8c
http://uvadoc.uva.es/handle/10324/46600

Near ambient pressure X-ray photoelectron - and impedance spectroscopy study of NiO - Ce0.9Gd0.1O2-δ anode reduction using a novel dual-chamber spectroelectrochemical cell

Autor: Edwin Kukk, Kuno Kooser, Margus Kodu, Rait Kanarbik, Samuli Urpelainen, Gunnar Nurk, Indrek Kivi, Enn Lust, T. Käämbre, Urmas Joost

Publikováno v: Journal of Power Sources. 378:589-596

This paper reports an experimental study, where the reduction of NiO-GDC to Ni-GDC is monitored using high temperature (HT) near ambient pressure (NAP) X-ray photoelectron spectroscopy (XPS) in combination with simultaneous impedance spectroscopy (IS

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5b22ad05d97d83dd20c1c76b3fb16787
http://juuli.fi/Record/0332331718