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Plasma Emission Monitoring-based Control Method for Reactive High-Power Impulse Magnetron Sputtering
Autor:
Törngren, Jacob
Thins films play a critical role in many technical fields today, such as optics, semiconductor, and tool manufacturing. A widely used method for thin film deposition is magnetron sputtering, with Direct-Current Magnetron Sputtering (DCMS) being the m
Externí odkaz:
http://urn.kb.se/resolve?urn=urn:nbn:se:ltu:diva-108197
