Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Syue-Ren Wu"'
Autor:
Syue-Ren Wu, 吳學仁
95
The modern lithography methods such as e-beam and UV lithography are not suitable to produce three dimensional (3D) structures. However, there is obvious advantage in both device function and density to produce structure with 3D characteristi
The modern lithography methods such as e-beam and UV lithography are not suitable to produce three dimensional (3D) structures. However, there is obvious advantage in both device function and density to produce structure with 3D characteristi
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/58771824277296359589
Autor:
Syue-Ren Wu1,2 hjwu@phys.sinica.edu.tw, Hwu, Yeukuang2 phhwu@sinica.edu.tw, Margaritondo, Giorgio3 giorgio.margaritondo@epfl.ch
Publikováno v:
Materials (1996-1944). Oct2012, Vol. 5 Issue 10, p1752-1773. 22p. 7 Black and White Photographs, 5 Diagrams, 10 Graphs.
Autor:
Jung Ho Je, Syue-Ren Wu, Yu-Tung Chen, Yeukuang Hwu, W. D. Chang, B. Y. Shew, C. I. Su, C. W. Chiu, Chi-Jen Liu, C C Chiang, T. N. Lo, Giorgio Margaritondo, I-Kuan Lin
Publikováno v:
Journal of Physics D: Applied Physics. 40:3172-3176
A nanofabrication approach based on advanced e-beam lithography and electrodeposition successfully produced high-resolution (≈40 nm line width) metal structures with high aspect ratio (>12) and high density. The combination of these characteristics
Autor:
Tung-He Chou, Syue-Ren Wu, Ling-Wuu Yang, Kuang-Chao Chen, Yung-Tai Hung, Tahone Yang, Kuang-Wei Chen, Chun-Fu Chen, Tuung Luoh
Publikováno v:
2015 China Semiconductor Technology International Conference.
Color abnormal phenomenon in post Cu chemical mechanical planarization (CMP) is found in 3X nm flash memory. TEM cross-section shows that there is no Cu residue but has localized thickness variation. This color abnormal phenomenon cannot be eliminate
Autor:
C. H. Wang, Wenbing Yun, Yong S. Chu, Chian Liu, Chung-Shi Yang, M. Feser, Y. Hwu, A. Tkachuk, Syue-Ren Wu, Qiang Shen, Chia-Chi Chien, Junyue Wang, Giorgio Margaritondo, Cheng-Liang Wang, F. De Carlo, H. J. Wu, Wah-Keat Lee, Jung Ho Je, Jae-mock Yi, Keng S. Liang
Publikováno v:
Applied Physics Letters. 92:103119
Substantial improvements in the nanofabrication and characteristics of gold Fresnel zone plates yielded unprecedented resolution levels in hard-x-ray microscopy. Tests performed on a variety of specimens with 8-10keV photons demonstrated a first-orde
Autor:
Kuang-Wei Chen, Tung-He Chou, Syue-Ren Wu, Chun-Fu Chen, Yung-Tai Hung, Tuung Luoh, Ling-Wuu Yang, Tahone Yang, Kuang-Chao Chen
Publikováno v:
2015 China Semiconductor Technology International Conference; 2015, p1-3, 3p
Autor:
Pei-Cheng Hsu, Yong Chu, Jae-Mock Yi, Cheng-Liang Wang, Syue-Ren Wu, Hwu, Y., Margaritondo, G.
Publikováno v:
Applied Physics Letters; 7/19/2010, Vol. 97 Issue 3, p033101, 3p, 2 Diagrams, 1 Map
Autor:
Jae-mock Yi, Yong S. Chu, Giorgio Margaritondo, Syue-Ren Wu, Yeukuang Hwu, Pei-Cheng Hsu, Cheng-Liang Wang
Ultrahigh resolution full-field transmission x-ray microscopy enabled us to observe detailed phenomena during the potentiostatic copper electrodeposition on polycrystalline gold. We detected two coexisting cluster populations with different sizes. Th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::77fe6351ade52652b3be57950f7b3d18
https://infoscience.epfl.ch/record/172500
https://infoscience.epfl.ch/record/172500