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pro vyhledávání: '"Syouhei Suzuki"'
Publikováno v:
Organic & Biomolecular Chemistry. 13:4686-4692
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Article
Organic & Biomolecular Chemistry. 2015 (13), p.4686-4692
Article
Organic & Biomolecular Chemistry. 2015 (13), p.4686-4692
Autor:
J. D. Rockrohr, Kazuaki Suzuki, E. V. Tressler, R. J. Quickle, J. E. Lieberman, Shinichi Kojima, G. Varnell, R. S. Dhaliwal, David J. Pinckney, Werner Stickel, Takaharu Miura, Shintaro Kawata, Steven D. Golladay, Christopher F. Robinson, Hans C. Pfeiffer, Kenji Morita, Teruaki Okino, M. S. Gordon, Hiroyasu Shimizu, W. T. Novak, Takeshi Yamaguchi, M. Sogard, K. Okamoto, Akikazu Tanimoto, Samuel K. Doran, Rodney A. Kendall, Syouhei Suzuki
Publikováno v:
Microelectronic Engineering. :163-172
PREVAIL is the high throughput e-beam projection approach to NGL, which IBM is pursuing in cooperation with Nikon as alliance partner. Key lithographic building blocks of the technology have been demonstrated experimentally with a proof-of-concept (P
Publikováno v:
Review of Scientific Instruments. 64:446-451
Computer simulation is used to optimize the design of a large‐field electron image projector system. Aberrations from mask to target are smaller than 0.02 μm in distortion and 0.12 μm in beam resolution for a 27×27 mm2 field size, 3:1 reduction
Autor:
Kazuya Okamoto, Kazuaki Suzuki, Syouhei Suzuki, Atsushi Yamada, Sumito Shimizu, Teruaki Okino, Koichi Kamijo, Kiyoshi Uchikawa, Shintaro Kawata, Tomoharu Fujiwara
Publikováno v:
SPIE Proceedings.
An electron projection lithography (EPL) system which projects reticle patterns onto a wafer will be applied to sub 100 nm lithography. Requirements for line width accuracy are very strict as feature sizes are less than 100 nm. For electron beam lith
Autor:
Tomoharu Fujiwara, Syouhei Suzuki, Sumito Shimizu, Hajime Yamamoto, Hiroyasu Shimizu, Takehisa Yahiro, Shintaro Kawata, Kazuaki Suzuki, Kenji Morita, Teruaki Okino, Noriyuki Hirayanagi
Publikováno v:
SPIE Proceedings.
Nikon is developing an Electron Beam (EB) stepper as one of the next-generation lithography systems for feature sizes of less than 100 nm. As a reticle for the EB stepper using a high power EB (acceleration voltage: 100 kV, current on reticle: 100 (m
Conference
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