Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Sven Krannich"'
Autor:
Renzo Capelli, Nathan Wilcox, Sven Krannich, Dinumol Devasia, Grizelda Kersteen, Arvind Sundaramurthy, Chang Ju Choi, Sandro Hoffmann, Zachary Rice, Patrick Straney, Klaus Gwosch, Markus Koch, Tim Helbig
Publikováno v:
Photomask Technology 2022.
Autor:
Renzo Capelli, Grizelda Kersteen, Sven Krannich, Markus Koch, Lukas Fischer, Matthias Roesch, Klaus Gwosch
Publikováno v:
Optical and EUV Nanolithography XXXV.
Autor:
Nazir Khan, Sven Krannich, Dominic Boll, Rolf Heid, Daniel Lamago, A. Ivanov, David Voneshen, Frank Weber
The phonon renormalization across the semiconductor-to-metal crossover in FeSi is investigated by inelastic neutron scattering combined with \textit{ab-initio} lattice dynamical calculations. A significant part of reciprocal space with a particular f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a26dd3ff14e5a144c6af058420625243
Autor:
Brid Connolly, Nikolai Kasper, Ilan Englard, Gaoliang Dai, Kurt G. Ronse, Shimon Levi, Kenslea Anne, Laurens Kwakman, Hayley Johanesen, Markus Bender, Sven Krannich, Ishai Swrtsband, Bogumila Kutrzeba-Kotowska, Maxim Rabinovitch, Frank Scholze, Romy Wende, Igor Turovets, Vladislav Kaplan
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXII.
Monitoring of pattern roughness for advanced technology nodes is crucial as this roughness can adversely affect device yield and degrade device performance. The main industry work horse for in-line roughness measurements is the CD-SEM, however, today