Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Sven Götze"'
Publikováno v:
Tetrahedron. 61:7081-7086
Herein, we report about the synthesis of sucrose analogues, obtained by two different approaches: a chemical and an enzymatic. The one step synthesis of the sucrose analogues with the exo-fructosyltransferase (EC 2.4.1.162) from Bacillus subtilis NCI
Autor:
Jeroen Jonkers, Guido Schriever, Sven Götze, Masaki Yoshioka, Günther Derra, Rob Snijkers, Rainer Müller, Max C. Schürmann, Jürgen Dr. Kleinschmidt, Denis Bolshukhin, Peter Zink, Marc Corthout
Publikováno v:
Alternative Lithographic Technologies.
The learning gained in previous developments for EUV Micro Exposure and Alpha Tools builds the basis for the EUVL source development at XTREME technologies and Philips EUV. Field data available from operation of these tools are in use for continuous
Publikováno v:
Chembiochem : a European journal of chemical biology. 9(1)
The combination of sucrose analogues as novel substrates (substrate engineering) and highly active recombinant beta-fructofuranosidase from A. niger (genetic engineering) provides a new powerful tool for the efficient preparative synthesis of tailor-
Autor:
Hans-Jürgen Hecht, Shukrallah Na’amnieh, Sven Götze, Roxana Moraru, Jürgen Seibel, Klaus Buchholz, Alice Pawlowski
In the present study, we have coupled detailed acceptor and donor substrate studies of the fructosyltransferase (FTF, levansucrase) (EC 2.4.1.162) from Bacillus subtilis NCIMB 11871, with a structural model of the substrate enzyme complex in order to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a9037a0d85ac118d6cc9b8ae409d5f08
https://hdl.handle.net/10033/14631
https://hdl.handle.net/10033/14631
Autor:
Christian H. Ziener, Jesko Dr. Brudermann, Vladimir Korobotchko, Frank Flohrer, Jürgen Dr. Kleinschmidt, Sven Götze, Kai Dr. Gäbel, Uwe Stamm, Guido Hergenhan, Guido Schriever, D. Bolshukhin, Imtiaz Ahmad, Diethard Klöpfel, Istvan Balogh, Henry Birner, S. Enke, Chinh Duc Prof. Tran, Jens Ringling
Publikováno v:
SPIE Proceedings.
Semiconductor chip manufacturers are expecting to use extreme UV lithography for production in 2009. EUV tools require high power, brilliant light sources at 13.5 nm with collector optics producing 120 W average power at entrance of the illuminator s
Publikováno v:
Biochemical Journal; 2007, Vol. 407 Issue 2, p189-198, 10p