Zobrazeno 1 - 10
of 44
pro vyhledávání: '"Suvkhanov, A."'
Autor:
Vispute, R. D., Narayan, J., Dovidenko, K., Jagannadham, K., Parikh, N., Suvkhanov, A., Budai, J. D.
Publikováno v:
Journal of Applied Physics; 12/15/1996, Vol. 80 Issue 12, p6720, 5p, 1 Black and White Photograph, 1 Diagram, 1 Chart, 5 Graphs
Autor:
Robert F. Davis, I.O. Usov, Thomas Gehrke, L.Ya. Krasnobaev, S. P. Withrow, Darren B. Thomson, Nalin R. Parikh, John D. Hunn, A. Suvkhanov
Publikováno v:
Materials Science Forum. :1615-1618
Autor:
Robert F. Davis, Mike Lioubtchenko, David Bray, Nalin R. Parikh, John D. Hunn, Eric Carlson, Agajan Suvkhanov, Michael D. Bremser
Publikováno v:
Scopus-Elsevier
Single-crystal GaN films grown on AlN buffer layers previously deposited on 6H-SiC(0001) were studied for radiation damage and its recovery using Rutherford backscattering/channeling, photoluminescence, and cross-sectional TEM. The highest fluence of
Autor:
A. Suvkhanov, K. Jagannadham, Katharine Dovidenko, John D. Budai, R. D. Vispute, Jagdish Narayan, Nalin R. Parikh
Publikováno v:
Journal of Applied Physics. 80:6720-6724
High‐quality ceramics based heteroepitaxial structures of oxide‐nitride‐semiconductors, i.e., SrTiO3/TiN/Si(100) have been fabricated by in situ pulsed laser deposition. The dependence of substrate temperature and oxygen partial pressure on the
Publikováno v:
Ferroelectrics. 124:189-194
With TGSe crystal as an example the y-irradiation effects upon the ferroelectric phase transition including dose dependence of Landau expansion coefficients are considered and the interpretation of the results is given.
Publikováno v:
Physica Status Solidi (a). 128:K53-K56
Autor:
C. A. Parker, V. A. Joshkin, Jerome J. Cuomo, Robert F. Davis, L. Y. Krasnobaev, Salah M. Bedair, A. Suvkhanov
Publikováno v:
Applied Physics Letters. 72:2838-2840
The effect of He ion implantation on the optical properties of epitaxial GaN-on-SiC was studied. We observed that He+ irradiation increases the relative intensity of the “blue emission” and resistivity of GaN films and decreases the intensity of
Autor:
Miguel A. Vilchis, Anthony M. Phan, Agajan Suvkhanov, Kenneth A. LaBel, Mohammad R. Mirabedini, Hak Kim, Jun Song, T.L. Irwin, Jeffrey Tung, R. Saigusa, Christina Seidleck, Rick Finlinson, J.D. Forney, Verne Hornback, C. Poivey, Melanie D. Berg
Publikováno v:
2006 IEEE Radiation Effects Data Workshop.
The authors present radiation data, total ionizing dose and single event effects, on the LSI logic 0.11 μm commercial process and two modified versions of this process. Modified versions include a buried layer to guarantee single event latch up immu
Autor:
K. Jagannadham, Ramki Kalyanaraman, John D. Budai, Katharine Dovidenko, Jagdish Narayan, Serge Oktyabrsky, Nalin R. Parikh, R. D. Vispute, A. Suvkhanov
Publikováno v:
Applied Physics Letters. 71:1709-1711
We have systematically investigated the effect of oxygen partial pressure (PO2) on the crystalline quality of SrTiO3 films grown on MgO (001) substrates using pulsed laser deposition and established optimized conditions for the growth of high-quality
Publikováno v:
Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on.
SRP, SIMS and C-V measurements of implanted Si wafers were carried out in this study to examine the effect of annealing conditions on the activation of acceptors. Shorter RTP annealing at relatively low temperatures provided higher Indium activation