Zobrazeno 1 - 10
of 106
pro vyhledávání: '"Suttmann, Oliver"'
Autor:
Young, Karl, Wen, Qi, Hanany, Shaul, Imada, Hiroaki, Koch, Jürgen, Matsumura, Tomotake, Suttmann, Oliver, Schütz, Viktor
We used two novel approaches to produce sub-wavelength structure (SWS) anti-reflection coatings (ARC) on silicon for the millimeter and sub-millimeter (MSM) wave band: picosecond laser ablation and dicing with beveled saws. We produced pyramidal stru
Externí odkaz:
http://arxiv.org/abs/1702.01768
Publikováno v:
In CIRP Annals - Manufacturing Technology 2019 68(1):217-220
Publikováno v:
In Procedia CIRP 2018 74:381-385
Autor:
von Witzendorff, Philipp, Pohl, Leonhard, Suttmann, Oliver, Heinrich, Peter, Heinrich, Achim, Zander, Jörg, Bragard, Holger, Kaierle, Stefan
Publikováno v:
In Procedia CIRP 2018 74:272-275
Publikováno v:
In Physics Procedia 2016 83:1279-1288
Publikováno v:
In Journal of Materials Processing Tech. November 2015 225:162-169
Publikováno v:
In Procedia Technology 2014 15:122-128
Autor:
Walter, Juergen, Hustedt, Michael, Staehr, Richard, Kaierle, Stefan, Jaeschke, Peter, Suttmann, Oliver, Overmeyer, Ludger
Publikováno v:
In Physics Procedia 2014 56:1153-1164
Autor:
von Witzendorff, Philipp, Stompe, Manuel, Moalem, Anas, Cvetkovic, Srecko, Suttmann, Oliver, Overmeyer, Ludger, Rissing, Lutz
Publikováno v:
In Precision Engineering January 2014 38(1):162-167
Autor:
Schutz, Viktor, Young, Karl, Hanany, Shaul, Koch, Jurgen, Suttmann, Oliver, Overmeyer, Ludger, Wen, Qi, Matsumura, Tomotake
Publikováno v:
Journal of Laser Micro Nanoengineering. 11(2):204-209
Accepted: 2016-04-25
資料番号: SA1160157000
資料番号: SA1160157000