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pro vyhledávání: '"Sushama Davar"'
Autor:
James Blatchford, Pala Balasubramaniam, Ravi M. Todi, Sushama Davar, Shibly S. Ahmed, Navneet Jain, Juhan Kim, Mahbub Rashed
Publikováno v:
2018 IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM).
Advanced Technology Development requires detailed and extensive Design and Technology Co-optimization (DTCO), from device to design to application, to balance system-dependent Power, Performance and Area (PPA) with manufacturability of the technology
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::668338058f5f9390630d1e29d22d1a6e
https://doi.org/10.1109/edtm.2018.8421508
https://doi.org/10.1109/edtm.2018.8421508
Autor:
Mahbub Rashed, Joerg Winkler, Frank Barth, Ram Prasad Gopannagari, Shibly S. Ahmed, Navneet Jain, Atul Kumar Kashyap, Thomas Herrmann, Siddiqi Arif A, James Blatchford, Sushama Davar, Anurag Mittal, Juhan Kim, Jeff Kim, Jens Pika, Michael Zier, Sravan Kumar Tekuru, Siva Krisha Potta, Jamie Schaeffer, Sunil Machha
Publikováno v:
2018 IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM).
A highly optimized 22FDSOI Logic Architecture for Power, Performance, Area (PPA) and cost is presented in this paper. Unique features of FDSOI technology including channel strain based PFET transistor performance enhancement are further advanced with
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fb9845920a422f37bb924cfa85797f6a
https://doi.org/10.1109/edtm.2018.8421481
https://doi.org/10.1109/edtm.2018.8421481
Conference
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Autor:
Kirsch, H., Clemons, D., Davar, S., Harman, J., Holder, C., Hunsicker, W., Procyk, F., Stefany, J., Yaney, D., Petrizzi, J.
Publikováno v:
1985 IEEE International Solid-State Circuits Conference Digest of Technical Papers; 1985, Issue XXVIII, p256-257, 2p