Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Susanne Leppack"'
Publikováno v:
Solid State Phenomena. 187:249-252
Mallinckrodt Baker, Inc. (MBI) has developed an aqueous fluoride-based cleaner (AFC1) that shows improved ultra-low k (ULK) and cobalt tungsten phosphide (CoWP) compatibility over dilute hydrofluoric acid (dHF) and a simple solvent based cleaner (SFC
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b4efc7e91ee6369eb835506a1bd995f0
https://doi.org/10.4028/www.scientific.net/ssp.187.249
https://doi.org/10.4028/www.scientific.net/ssp.187.249
Autor:
Susanne Leppack, Eugene C. Baryschpolec, Matthias Schaller, Madhukar Bhaskara Rao, Christin Bartsch, Andreas Ott, Aiping Wu
Publikováno v:
Microelectronic Engineering. 87:1685-1688
Implementation of CoWP metal caps into Cu/low-k integration schemes requires a wet stripper that not only gives efficient cleaning but also has good compatibility to CoWP and low-k dielectrics. This paper describes a novel non-fluoride CoWP compatibl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2f12812d70d572804effff6654fe658b
https://doi.org/10.1016/j.mee.2009.11.048
https://doi.org/10.1016/j.mee.2009.11.048
Autor:
Stefan E. Schulz, Daniel Fischer, Matthias Schaller, Christin Bartsch, Susanne Leppack, Oszinda Thomas, Lukas Gerlich
Publikováno v:
2011 IEEE International Interconnect Technology Conference.
In this paper the effect of a vapor phase based silylation process on patterned test structures using ULK based ILD's was investigated. It was found that the resistance to capacitance (RC) behavior can be improved. This improvement was found to be sc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8ce03a16e76eb9f03c2f5230188b7b94
https://doi.org/10.1109/iitc.2011.5940329
https://doi.org/10.1109/iitc.2011.5940329
Publikováno v:
ECS Meeting Abstracts. :2161-2161
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9b5638a33a85d03750c77f7364c4943b
https://doi.org/10.1149/ma2009-02/26/2161
https://doi.org/10.1149/ma2009-02/26/2161