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pro vyhledávání: '"Susan Weiher-Tellford"'
Autor:
Uzodinma Okoroanyanwu, Remo Kirsch, Antje Martin, Wolfram Grundke, Eran Valfer, Susan Weiher-Tellford, Ute Vogler, Nurit Racah, Richard Moerman, Mirko Beyer, Renana Perlovitch, Peter Vanoppen
Publikováno v:
SPIE Proceedings.
Immersion lithography addresses the limits of optical lithography by providing higher NA's (NA > 1), which enable imaging of smaller features and hence it enables production of 45nm logic devices. One of the key challenges of this advanced technology
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7bd65ae40722f2201b2a40476afc40d6
https://doi.org/10.1117/12.777371
https://doi.org/10.1117/12.777371
