Linear smoothed extended finite element method

Autor: Surendran, M, Natarajan, S, Bordas, SPA, Palani, GS

Publikováno v: International Journal for Numerical Methods in Engineering, 2017

The extended finite element method (XFEM) was introduced in 1999 to treat problems involving discontinuities with no or minimal remeshing through appropriate enrichment functions. This enables elements to be split by a discontinuity, strong or weak a

Externí odkaz: http://arxiv.org/abs/1701.03997

Cell-based smoothed finite element method for modelling interfacial cracks with non-matching grids

Autor: Surendran, M., Lee, Changkye, Nguyen-Xuan, H., Liu, G.R., Natarajan, Sundararajan

Publikováno v: In Engineering Fracture Mechanics 1 February 2021 242

Extensive hydrogen incorporation is not necessary for superconductivity in topotactically reduced nickelates.

Autor: Balakrishnan PP; NIST Center for Neutron Research, National Institute of Standards and Technology, Gaithersburg, MD, 20899, USA. purnima.balakrishnan@nist.gov., Ferenc Segedin D; Department of Physics, Harvard University, Cambridge, MA, 02138, USA., Chow LE; Department of Physics, Faculty of Science, National University of Singapore, Singapore, 117551, Singapore., Quarterman P; NIST Center for Neutron Research, National Institute of Standards and Technology, Gaithersburg, MD, 20899, USA., Muramoto S; Material Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, MD, 20899, USA., Surendran M; Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, CA, 90089, USA.; Core Center for Excellence in Nano Imaging, University of Southern California, Los Angeles, CA, 90089, USA., Patel RK; Department of Physics, Indian Institute of Science, Bengaluru, 560012, India., LaBollita H; Department of Physics, Arizona State University, Tempe, AZ, 85287, USA., Pan GA; Department of Physics, Harvard University, Cambridge, MA, 02138, USA., Song Q; Department of Physics, Harvard University, Cambridge, MA, 02138, USA., Zhang Y; The Rowland Institute at Harvard, Harvard University, Cambridge, MA, 02138, USA., El Baggari I; The Rowland Institute at Harvard, Harvard University, Cambridge, MA, 02138, USA., Jagadish K; Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, CA, 90089, USA., Shao YT; Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, CA, 90089, USA.; Core Center for Excellence in Nano Imaging, University of Southern California, 925 Bloom Walk, Los Angeles, CA, 90089, USA., Goodge BH; School of Applied and Engineering Physics, Cornell University, Ithaca, NY, 14853, USA.; Kavli Institute at Cornell for Nanoscale Science, Ithaca, NY, 14853, USA.; Max Planck Institute for Chemical Physics of Solids, 01187, Dresden, Germany., Kourkoutis LF; School of Applied and Engineering Physics, Cornell University, Ithaca, NY, 14853, USA.; Kavli Institute at Cornell for Nanoscale Science, Ithaca, NY, 14853, USA., Middey S; Department of Physics, Indian Institute of Science, Bengaluru, 560012, India., Botana AS; Department of Physics, Arizona State University, Tempe, AZ, 85287, USA., Ravichandran J; Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, CA, 90089, USA. j.ravichandran@usc.edu.; Core Center for Excellence in Nano Imaging, University of Southern California, Los Angeles, CA, 90089, USA. j.ravichandran@usc.edu.; Ming Hsieh Department of Electrical and Computer Engineering, University of Southern California, Los Angeles, CA, 90089, USA. j.ravichandran@usc.edu., Ariando A; Department of Physics, Faculty of Science, National University of Singapore, Singapore, 117551, Singapore. ariando@nus.edu.edu., Mundy JA; Department of Physics, Harvard University, Cambridge, MA, 02138, USA. mundy@fas.harvard.edu., Grutter AJ; NIST Center for Neutron Research, National Institute of Standards and Technology, Gaithersburg, MD, 20899, USA. alexander.grutter@nist.gov.

Publikováno v: Nature communications [Nat Commun] 2024 Aug 27; Vol. 15 (1), pp. 7387. Date of Electronic Publication: 2024 Aug 27.

A Hybrid Pulsed Laser Deposition Approach to Grow Thin Films of Chalcogenides.

Autor: Surendran M; Mork Family Department of Chemical Engineering and Materials Science, and Core Center for Excellence in Nano Imaging, University of Southern California, 925 Bloom Walk, Los Angeles, CA, 90089, USA., Singh S; Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, 925 Bloom Walk, Los Angeles, CA, 90089, USA., Chen H; Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, 925 Bloom Walk, Los Angeles, CA, 90089, USA., Wu C; Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, 925 Bloom Walk, Los Angeles, CA, 90089, USA., Avishai A; Core Center for Excellence in Nano Imaging, University of Southern California, 925 Bloom Walk, Los Angeles, CA, 90089, USA., Shao YT; Mork Family Department of Chemical Engineering and Materials Science, and Core Center for Excellence in Nano Imaging, University of Southern California, 925 Bloom Walk, Los Angeles, CA, 90089, USA., Ravichandran J; Mork Family Department of Chemical Engineering and Materials Science, Core Center for Excellence in Nano Imaging and Ming Hsieh Department of Electrical and Computer Engineering, University of Southern California, 925 Bloom Walk, Los Angeles, CA, 90089, USA.

Publikováno v: Advanced materials (Deerfield Beach, Fla.) [Adv Mater] 2024 May; Vol. 36 (19), pp. e2312620. Date of Electronic Publication: 2024 Feb 12.

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