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of 43
pro vyhledávání: '"Suni, Tommi"'
Autor:
Suni, Tommi.
Thesis (doctoral)--Helsinki University of Technology, 2006.
Includes bibliographical references. Also available on the World Wide Web.
Includes bibliographical references. Also available on the World Wide Web.
Externí odkaz:
http://www.vtt.fi/inf/pdf/publications/2006/P609.pdf
Publikováno v:
In Handbook of Silicon Based MEMS Materials and Technologies Edition: Third Edition. 2020:567-580
Autor:
Mäkinen, Jari, Suni, Tommi
Publikováno v:
In Handbook of Silicon Based MEMS Materials and Technologies Edition: Third Edition. 2020:215-246
Publikováno v:
In Solid State Electronics 2007 51(2):328-332
Publikováno v:
Ritasalo, R, Ylivaara, O M E, Pilvi, T, Suni, T & Veselov, A 2019, ' Stresses in ALD films : aiming for zero stress thin films ', 14th International conference on Films and Coatings 2019, St. Petersburg, Russian Federation, 14/05/19-16/05/19 .
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=355e65625b88::254bc69b48b831e009a4ea709e4e9906
https://cris.vtt.fi/en/publications/b940f211-bb1d-48f4-8752-a877f6e5f241
https://cris.vtt.fi/en/publications/b940f211-bb1d-48f4-8752-a877f6e5f241
Publikováno v:
Ritasalo, R, Ylivaara, O, Pilvi, T & Suni, T 2018, ' Stresses in ALD films : Aiming for zero stress thin films ', 4th International Conference on ALD Applications and 2018 China ALD Conference, CALD2018, Shenzhen, China, 14/10/18-17/10/18 .
Ritasalo, R, Ylivaara, O, Pilvi, T & Suni, T 2018, ' Stresses in ALD films : Aiming for zero stress thin films ', 18th International Conference on Atomic Layer Deposition, ALD/ALE 2018, Incheon, Korea, Republic of, 29/07/18-1/08/18 pp. 49 . < https://ald2018.avs.org/wp-content/uploads/2018/07/ALD-ALE-2018-Schedule.pdf >
Ritasalo, R, Ylivaara, O, Pilvi, T & Suni, T 2018, ' Stresses in ALD films : Aiming for zero stress thin films ', 18th International Conference on Atomic Layer Deposition, ALD/ALE 2018, Incheon, Korea, Republic of, 29/07/18-1/08/18 pp. 49 . < https://ald2018.avs.org/wp-content/uploads/2018/07/ALD-ALE-2018-Schedule.pdf >
When grown films by atomic layer deposition (ALD) both intrinsic and thermal stresses are formed into the film; latter due to the mismatch in the thermal expansion coefficient of the substrate and the grown film. Films under high residual stress may
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::ec9fabdda9d8216038ef0a18209a8c79
https://cris.vtt.fi/en/publications/1ffb1361-5d2a-45e0-a319-63574c0d6567
https://cris.vtt.fi/en/publications/1ffb1361-5d2a-45e0-a319-63574c0d6567
Autor:
Henttinen, Kimmo, Suni, Tommi
Publikováno v:
In Handbook of Silicon Based MEMS Materials and Technologies Edition: Second Edition. 2016:591-598
Autor:
Mäkinen, Jari, Suni, Tommi
Publikováno v:
In Handbook of Silicon Based MEMS Materials and Technologies Edition: Second Edition. 2016:206-237
Autor:
Aalto, Timo, Airaksinen, Veli-Matti, Albert, Stephan Gerhard, Allegato, Giorgio, Amiotti, Marco, Anttila, Olli, Auersperg, Juergen, Bonucci, Antonio, Bose, Indranil Ronnie, Braun, Tanja, Broas, Mikael, Burggraf, J., Cameron, Christopher, Candler, Rob N., Cao, Zhen, Cardoso, André, Chen, Kuo-Shen, Conte, Andrea, Cozma, Adriana, Davis, Cristina E., Dempwolf, Sophia, Dixit, Pradeep, Dost, Michael, Dragoi, Viorel, Eränen, Simo, Fain, Bruno, Figeys, B., Fischer, Andreas C., Flötgen, Christoph, Franssila, Sami, Friedberger, Alois, Fueldner, Marc, Ganchenkova, Maria, Gonzalez, Pilar, Gosálvez, Miguel A., Grimes, Michael, Haapalinna, Atte, Hagelin, Paul, Hammond, Paul, Henttinen, Kimmo, Henttonen, Vesa, Horsley, David, Hoshi, Takeo, Itoh, Satoshi, Jakobsen, Henrik, Jansen, R., Jonsson, Kerstin, Kähler, Dirk, Kannojia, Harindra Kumar, Kattelus, Hannu, Kissinger, Gudrun, Knechtel, Roy, Knese, Kathrin, Kolari, Kai, Koskenvuori, Mika, Kuisma, Heikki, Kulkarni, Amit, Laermer, Franz, Landesberger, Christof, Leinenbach, Christina, LeVasseur, Michael K., Li, Jue, Lin, Yuyuan, Lindner, Paul F., Lodewijks, K., Lofink, Fabian, Longoni, Giorgio, Luber, Sebastian Markus, Mahmud-ul-hasan, M., Mäkinen, Jari, Mäntysalo, Matti, Martin, Devin, Maspero, Federico, Mattila, Toni T., Mauri, Luca, Merz, Peter, Meyer, Doug, Moraja, Marco, Motooka, Teruaki, Müller, Gerhard, Muralt, Paul, Nieminen, Risto M., Niklaus, Frank, Oggioni, Laura, Olkkonen, Juuso, Österlund, Elmeri, Ou, Kuang-Shun, Paloheimo, Jari, Pasanen, Toni P., Paulasto-Kröckel, Mervi, Plach, Thomas, Polizzi, Jean-Philippe, Pressel, Klaus, Putkonen, Matti, Puurunen, Riikka L., Reinert, Wolfgang, Rizzi, Enea, Rochus, V., Ross, Glenn, Rottenberg, X., Sainiemi, Lauri, Savin, Hele, Schenk, Harald, Schikowski, Marc, Schulze, Matthias, Seema, S., Severi, S., Skogström, Lasse, Suga, Tadatomo, Sullivan, Scott, Suni, Tommi, Theuss, Horst, Tilli, Markku, Tilmans, H.A.C., Tittonen, Ilkka, Tofteberg, Hannah, Törmä, Pekka, Tuomikoski, Santeri, Tyholdt, Frode, Uda, Tsuyoshi, Vallin, Örjan, Valzasina, Carlo, Veijola, Timo, Viinikka, Eeva, Vogel, Dietmar, Vogl, Andreas, Vuorinen, Vesa, Westervelde, W.J., Wicht, Sebastian, Wieland, Robert, Winkler, Bernhard, Yobas, Levent, Zanotti, Luca, Zubel, I.
Publikováno v:
In Handbook of Silicon Based MEMS Materials and Technologies Edition: Third Edition. 2020:xv-xvii