Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Sungmuk Lee"'
Publikováno v:
2006 IEEE International Symposium on Consumer Electronics.
This paper focus on implementation results for RF analog Base Station sub-system supporting 802.16d standard, called WiMAX and HSDPA, which is designed and implemented for reconfigurable Base Station using SDR technologies.
Autor:
Hyun-Hee, Jung, Won-Myung, Woo, Joon-Mo, Yang, Chunho, Choi, Jonghan, Lee, Gilwon, Yoon, Jong S, Yang, Sungmuk, Lee, Kwang-Sup, Soh
Publikováno v:
Indian journal of experimental biology. 41(5)
Left-right biophoton asymmetry from the palm and the dorsum of hands from 7 Korean hemiparesis patients were studied. There is a strong tendency that the left-hemiparesis patients emit more biophotons from the right than the left hands, while the rig
Publikováno v:
Applied Optics. 37:2542
We show quantitatively through a computer simulation the effect ofvector diffraction on the image in optical lithography. Thesimulation was made with a new program, and the variation ofdiffraction as the magnification was varied was calculated for va
Autor:
Seongho Jeon, Ki-Ho Baik, Donggyu Yim, Chang-Nam Ahn, Kyeong‐Woon Lee, Bae‐Doo Cho, Sungmuk Lee
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 14:4193
The vector image code (VIC) consisting of the vector transmission cross coefficient (TCC) and Fourier transform of the mask function is widely applied to simulate the effects of polarization in microlithography. Until now studies were restricted to t
Publikováno v:
Japanese Journal of Applied Physics. 35:780
The effects of degree of coherence in optical lithography using the dummy diffraction mask are investigated by simulation and experiment. Influences on resolution and depth of focus of the repeated and isolated patterns are simulated for the several
Publikováno v:
American Journal of Physics; Jan2010, Vol. 78 Issue 1, p71-74, 4p
Publikováno v:
SPIE Proceedings.
In modern photolithography, alignment to targets which are burried under layers of highly absorptive coatings at the actinic wavelength, is a severe problem. A novel optical technique has been developed at TRE allowing the use of an arbitrary optical
Autor:
Sungmuk Lee, Michele Nuhn
Publikováno v:
Advances in Resist Technology and Processing III.
The system performance of the THE i-line 10X wafer stepper with the Zeiss prototype 0.315 NA lens has been reported in previous papers.1,2 This paper describes the enhanced optical properties achieved using advanced processing materials and process o
Conference
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