Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Sungha Woo"'
Publikováno v:
Journal of Ambient Intelligence and Humanized Computing.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::663a6be087a48f8165d66b8859999fdc
https://doi.org/10.1007/s12652-023-04520-0
https://doi.org/10.1007/s12652-023-04520-0
Autor:
Heeyeon Jang, Sangpyo Kim, Kristian Schulz, Sungha Woo, Youngmo Lee, Anthony Garetto, Seolchong Hwang, Hyunjo Yang
Publikováno v:
SPIE Proceedings.
The standard method for defect disposition and verification of repair success in the mask shop is through the utilization of the aerial imaging platform, AIMSTM. The CD (Critical Dimension) deviation of the defective or repaired region as well as the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b5a961f2e80c7132e2f3101382bd4da6
https://doi.org/10.1117/12.2240301
https://doi.org/10.1117/12.2240301
Publikováno v:
SPIE Proceedings.
Defect verification has become significantly difficult to higher technology nodes over the years. Traditional primary method of defect (include repair point) control consists of inspection, AIMS and repair steps. Among them, AIMS process needs variou
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::917886db55873c14c80c101211285ac1
https://doi.org/10.1117/12.2195850
https://doi.org/10.1117/12.2195850
Publikováno v:
Photomask Technology 2008.
As design rule of memory device is smaller and smaller, the CD uniformity of a photomask become the most important factor to satisfy wafer exposure performance. Once the photomask is made, CD uniformity of the mask can't be changed and if CD uniformi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e7bbdab19e526fb9651d6a1f9bb216cf
https://doi.org/10.1117/12.801432
https://doi.org/10.1117/12.801432