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pro vyhledávání: '"Sungchan Jo"'
Publikováno v:
Advanced Electronic Materials, Vol 9, Iss 7, Pp n/a-n/a (2023)
Abstract The deposition of high‐quality dielectric films on graphene surfaces is crucial in fabricating high‐performance graphene‐based electronics. In this study, the first application of UV‐assisted atomic layer deposition (UV‐ALD) to gra
Externí odkaz:
https://doaj.org/article/f3f3d1b4f41844da95f2fa9a4707e057