Zobrazeno 1 - 10
of 472
pro vyhledávání: '"Sundaravel, B."'
Publikováno v:
In Physica B: Condensed Matter 1 February 2024 674
Autor:
Saravanan, K., Sen, Sujoy, Sharma, Chidambara, Amirthapandian, S., Ganesan, K., Gupta, Mukul, Sundaravel, B., Chandra Shekar, N.V.
Publikováno v:
In Journal of Luminescence November 2023 263
Autor:
Abhishek, K.J., Gundanna, Susheel Kumar, Ingale, Deepak V., Sundaravel, B., Bhatta, Umananda M.
Publikováno v:
In Physica B: Condensed Matter 1 December 2022 646
Publikováno v:
In Nuclear Inst. and Methods in Physics Research, B 1 October 2021 504:50-57
Publikováno v:
In Surfaces and Interfaces June 2019 15:239-243
We discuss four important aspects of 1.5 MeV Au2+ ion-induced flux dependent sputtering from gold nanostrcutures (of an average size 7.6 nm and height 6.9 nm) that are deposited on silicon substrates: (a) Au sputtering yield at the ion flux of 6.3x10
Externí odkaz:
http://arxiv.org/abs/0806.3162
Enhanced diffusion of gold atoms into silicon substrate has been studied in Au thin films of various thicknesses (2.0, 5.3, 10.9 and 27.5 nm) deposited on Si(111) and followed by irradiation with 1.5 MeV Au2+ at a flux of 6.3x10^12 ions cm-2 s-1 and
Externí odkaz:
http://arxiv.org/abs/0805.3965
Autor:
Ghatak, J., Bhatta, M. Umananda, Sundaravel, B., Nair, K. G. M., Liou, Sz-Chian, Chen, Cheng-Hsuan, Wang, Yuh-Lin, Satyam, P. V.
We report a direct observation of dramatic mass transport due to 1.5 MeV Au2+ ion impact on isolated Au nanostructures of an average size 7.6 nm and a height 6.9 nm that are deposited on Si (111) substrate under high flux (3.2x10^10 to 6.3x10^12 ions
Externí odkaz:
http://arxiv.org/abs/0803.3495
Autor:
Dhara, S., Sundaravel, B., Nair, K. G. M., Kesavamoorthy, R., Valsakumar, M. C., Rao, T. V. Chandrasekhar, Chen, L. C., Chen, K. H.
Publikováno v:
Applied Physics Letters 88 (17) 173110 (2006)
Ferromagnetic ordering is reported in the post-annealed samples of Co doped n-GaN formed by Co+ implantation. A maximum Curie temperature ~ 250K is recorded for the sample with 8 atomic percent Co. Particle induced x-ray emission-channeling study con
Externí odkaz:
http://arxiv.org/abs/0708.2217
Autor:
Sumathi Suresh, Santanu Bera, Chandramohan Palogi, Sundaravel B, Jegadeesan P, Krishna Mohan T.V
Publikováno v:
Corrosion Engineering, Science and Technology. :1-16