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For at-wavelength observation of a lithography mask, recently, we proposed an EUV microscope consisting of multilayer-mirror objective (operating wavelength: 13.5 nm, numerical aperture: 0.25). To provide diffraction-limited spatial resolution below
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::14b6c7123b281940ed29740e9d4d1d7a
