Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Sukjong Bae"'
Autor:
Sukjong Bae, Flip de Jong, Rik Nuyts, Rahul Sasikumar, Haifeng Yuan, Seongjune Min, Jin Choi, Sanghee Lee, Joonsoo Park, Johan Hofkens
Publikováno v:
Micro and Nano Engineering, Vol 19, Iss , Pp 100180- (2023)
The fabrication of highly qualified patterns for photomasks using an electron beam writer is one of the key methods to achieve the requirements for high-end semiconductor devices manufacturing. We demonstrate in-situ examination of morphology changes
Externí odkaz:
https://doaj.org/article/c0251609fd034b55b5cde3fe0458f653
Publikováno v:
Journal of the Korean Physical Society. 51:1782-1786
Publikováno v:
Colloids and Surfaces A: Physicochemical and Engineering Aspects. :552-555
In atomic force microscope (AFM) anodization lithography, voltage modulation is an important factor leading to enhanced oxide growth rate, increased aspect ratio of oxide patterns and greater control of oxide features. Through the reduction of space
Publikováno v:
SPIE Proceedings.
One of the concerned phenomena that influencing to the performance of electron beam mask writer is contamination of deflector. Previous studies show that the relation between the deflector contamination and pattern placement error. In fact, the sourc
Publikováno v:
SPIE Proceedings.
By the development of double exposure technique and the EUV lithography the pattern placement error of photomask is interested because of its impact on size and position of wafer pattern. Among various sources to induce the pattern placement error, w
Publikováno v:
Nanotechnology. 16(10)
An applied bias voltage between the atomic force microscope tip and the substrate is one of the important factors related to the growth of oxide patterns. A pulse modulator was used to apply a pulsed bias voltage that synchronizes with the resonance
Autor:
Sang Jung Ahn, Haiwon Lee, Chung Choo Chung, Cheolsu Han, Dal Hyun Kim, Ki Young Jung, Ji Sun Choi, Sukjong Bae
Publikováno v:
Ultramicroscopy. 107(10-11)
Multi-walled carbon nanotube (CNT) tips were used in atomic force microscope (AFM) anodization lithography to investigate their advantages over conventional tips. The CNT tip required a larger threshold voltage than the mother silicon tip due to the