Zobrazeno 1 - 10
of 60
pro vyhledávání: '"Suk-Joo Lee"'
Publikováno v:
Energy and Buildings. 110:23-30
The objective of this study is to provide a practical method for estimating the energy saving potential of residential buildings using utility bills that are relatively easy to obtain from occupied buildings. The building characteristics and utility
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cd216096e0d5045bd983d7dfa1a75de9
https://doi.org/10.1016/j.enbuild.2015.10.038
https://doi.org/10.1016/j.enbuild.2015.10.038
Publikováno v:
Korean Journal of Air-Conditioning and Refrigeration Engineering. 26:394-400
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d8e7ce9e998d427a196ff0ee1bc3c5cb
https://doi.org/10.6110/kjacr.2014.26.8.394
https://doi.org/10.6110/kjacr.2014.26.8.394
Publikováno v:
Sustainability; Volume 10; Issue 4; Pages: 1015
Sustainability, Vol 10, Iss 4, p 1015 (2018)
Sustainability, Vol 10, Iss 4, p 1015 (2018)
Trust is the key ingredient for sustainable transactions. In the concept of trust, the trustor trusts the trustees. In e-commerce, the trustor is the buyer and the trustees are the intermediaries and the seller. Intermediaries provide the web-based i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::78cf73d8237382647bd3623b0e554e4d
https://doi.org/10.3390/su10041015
https://doi.org/10.3390/su10041015
Autor:
Sang-Wook Kim, Sung-Soo Suh, Yong-Jin Chun, Young-Chang Kim, Suk-Joo Lee, Jung-Hyeon Lee, Sung-Woon Choi, Chang-Jin Kang, Woo-Sung Han, Joo-Tae Moon
Publikováno v:
Japanese Journal of Applied Physics. 47:4893-4897
In this paper, key process factors are computed during OPC for each fragment segments to perform a full-chip analysis of hot spot and removal of hot spot via process factor cost driven auto-correction or provide design guide for design for patterning
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::eb081f33be53883ea30d6c2f7ed114bf
https://doi.org/10.1143/jjap.47.4893
https://doi.org/10.1143/jjap.47.4893
Publikováno v:
Japanese Journal of Applied Physics. 46:7684-7688
An analytic relationship of the mask mean-to-target (MTT) and the mask uniformity specifications affected by the mask proximity effect (MPE) is suggested. MPE mainly caused by e-beam proximity and the etch loading effect makes different MTTs for patt
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3320813e0fe0bddcff2f64e7cb640b2c
https://doi.org/10.1143/jjap.46.7684
https://doi.org/10.1143/jjap.46.7684
Publikováno v:
Japanese Journal of Applied Physics. 46:6135-6139
The double-patterning process was investigated for line-and-space (L/S) patterns of 65 nm half pitch [k1=0.286, 0.85-numerical aperture (NA) ArF dry system] by plasma treatment of photoresist (PR). The sequence of this patterning is exposure–plasma
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::87ab05465fe7b15848ef20f5d8934d1d
https://doi.org/10.1143/jjap.46.6135
https://doi.org/10.1143/jjap.46.6135
Autor:
Han-Ku Cho, Sung-Woo Lee, Young-Chang Kim, Kyoung-yoon Back, Suk-Joo Lee, Sungsoo Suh, Sang-Wook Kim
Publikováno v:
Microelectronic Engineering. 84:755-760
Use of off-axis illumination such as dipole and cross-pole to obtain minimum dense pitch resolution limits process margin due to side lobe defect pattern formation. Side lobe or ghost images are unwanted additional patterns formed at wafer image at c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e91b62b19b610db2686fbd9375838c8a
https://doi.org/10.1016/j.mee.2007.01.039
https://doi.org/10.1016/j.mee.2007.01.039
Publikováno v:
Design for Manufacturability through Design-Process Integration VI.
Current metal integration process normally uses hard mask for dry etch process instead of resist to compensate thin resist thickness. As the pattern size becomes smaller, thinner resist thickness is required to get sufficient lithography process wind
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b7b34bfbbb648e925d3f3bdce2ab42e5
https://doi.org/10.1117/12.917881
https://doi.org/10.1117/12.917881
Autor:
Cynthia Zhu, Suk-Joo Lee, Ja-hum Ku, John L. Sturtevant, Thuy Do, Juhwan Kim, Aasutosh Dave, Jaeyeol Maeng, Uwe Hollerbach, Yuri Granik, No-Young Chung, Min-Chul Oh, Sunwook Jung, Kostas Adam, Hyung-Joo Youn
Publikováno v:
SPIE Proceedings.
Photolithography for the formerly "non-critical" implant blocking layers is becoming more challenging as edge placement control budgets for junction definition shrink with each node. In addition to the traditional proximity effects associated with th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c241c0acb297c484af10504a959e0fe1
https://doi.org/10.1117/12.917984
https://doi.org/10.1117/12.917984
Autor:
Hua-yu Liu, No-Young Chung, Seung-Hoon Park, Stefan Hunsche, Songyi Park, Venu Vellanki, Mu Feng, Joobyoung Kim, Stanislas Baron, Song Lan, Hyung-Joo Youn, Jong-Tai Yoon, Xiaobo Xie, Jaeyeol Maeng, Soung-Su Woo, Suk-Joo Lee, Ja-hum Ku
Publikováno v:
SPIE Proceedings.
Implant layer patterning is becoming challenging with node shrink due to decreasing critical dimension (CD) and usage of non-uniform reflective substrates without bottom anti-reflection coating (BARC). Conventional OPC models are calibrated on a unif
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e971a2d070ce145a547a0f257be5ab87
https://doi.org/10.1117/12.918000
https://doi.org/10.1117/12.918000