Výsledky vyhledávání - "Suhas Pillai"

An SEM-based deep defect classification system for VSB mask writer that works with die-to-die and die-to-database inspection methods using multiple digital twins built with the state-of-the-art neural networks

Autor: Suhas Pillai, Jun Yashima, Aki Fujimura, Thang Nguyen, Ajay Baranwal, Noriaki Nakayamada, Jim Dewitt

Publikováno v: Photomask Technology 2021.

The two standard reticle defect inspection methods are die-to-die and die-to-database. The die-to-die inspection method compares images from the two dice on the same reticle to identify any defect. However, the die-to-database inspection method compa

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::d7d1eadfefdbd187ed1642a6a88c6d0a
https://doi.org/10.1117/12.2601004

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A deep learning toolset to mask analysis with SEM digital twins

Autor: Ajay K. Baranwal, Suhas Pillai, Thang Nguyen, Jun Yashima, Jim Dewitt, Noriaki Nakayamada, Mikael Wahlsten, Aki Fujimura

Publikováno v: Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::ce5eada4edd2398f4834de7c3b01b9cc
https://doi.org/10.1117/12.2601856

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Intelligent character recognition using fully convolutional neural networks

Autor: Frank Brockler, Raymond Ptucha, Suhas Pillai, Paul Hutkowski, Felipe Petroski Such, Vatsala Singh

Publikováno v: Pattern Recognition. 88:604-613

The recognition of handwritten text is challenging as there are virtually infinite ways a human can write the same message. Deep learning approaches for handwriting analysis have recently demonstrated breakthrough performance using both lexicon-based

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::ece1963607eaa7c2bee8a677813af1b8
https://doi.org/10.1016/j.patcog.2018.12.017

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A deep learning mask analysis toolset using mask SEM digital twins

Autor: Aki Fujimura, Noriaki Nakayamada, Ajay Baranwal, Jim Dewitt, Mikael L. Wahlsten, Thang Nguyen, Suhas Pillai, Jun Yashima

Publikováno v: Photomask Technology 2020.

Sub-nanometer accuracy attainable with electron micrograph SEM images is the only way to “see” well enough for the mask analysis needed in EUV mask production. Because SEM images are pixel dose maps, deep learning (DL) offers an attractive altern

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::2e7d2a145d767530b74adf232d64c5b8
https://doi.org/10.1117/12.2576431

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Robust Spatial Filtering With Graph Convolutional Neural Networks

Autor: Raymond Ptucha, Andrew M. Michael, Chao Zhang, Shagan Sah, Miguel Dominguez, Felipe Petroski Such, Nathan D. Cahill, Suhas Pillai

Publikováno v: IEEE Journal of Selected Topics in Signal Processing. 11:884-896

Convolutional Neural Networks (CNNs) have recently led to incredible breakthroughs on a variety of pattern recognition problems. Banks of finite impulse response filters are learned on a hierarchy of layers, each contributing more abstract informatio

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::588d479dcf29e5585d979669f0d07255
https://doi.org/10.1109/jstsp.2017.2726981

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Five deep learning recipes for the mask-making industry

Autor: Aki Fujimura, Michael Pomerantsev, Noriaki Nakayamada, Mariusz Niewczas, Suhas Pillai, Ajay Baranwal, Mike Meyer, Mikael L. Wahlsten, Thang Nguyen

Publikováno v: Photomask Technology 2019.

Deep learning has an increasing impact on our personal and professional lives. Deep learning has the potential to transform mask, semiconductor and electronics manufacturing. This paper reviews key results from the Center for Deep Learning in Electro

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::10665e14519b26ce90a7cf1973815349
https://doi.org/10.1117/12.2538440

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Making digital twins using the Deep Learning Kit (DLK)

Autor: Abhishek Shendre, Linyong Pang, Suhas Pillai, Aki Fujimura, Ajay Baranwal, Mike Meyer, Ryan Pearman, Mariusz Niewczas, Henry Yu, Thang Nguyen

Publikováno v: Photomask Technology 2019.

Deep learning (DL) is one of the fastest-growing fields in artificial intelligence (AI). While still in its early stages of adoption, DL has already shown it has the potential to make significant changes to the lithography and photomask industries th

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::e9f1d78306f79982323f6cc70cab9e40
https://doi.org/10.1117/12.2538508

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Key frame extraction for salient activity recognition

Autor: Shagan Sah, Sourabh Kulhare, Raymond Ptucha, Suhas Pillai

Publikováno v: ICPR

Surveillance cameras have become big business, with most metropolitan cities spending millions of dollars to watch residents, both from street corners, public transportation hubs, and body cameras on officials. Watching and processing the petabytes o

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4c19eb64734f9097aab7888bf2cde63c
https://doi.org/10.1109/icpr.2016.7899739

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Image description through fusion based recurrent multi-modal learning

Autor: Suhas Pillai, Shagan Sah, Raymond Ptucha, Ram Manohar Oruganti

Publikováno v: ICIP

Current research in computer vision and machine learning has demonstrated some great abilities at detecting and recognizing objects in natural images. The promising results in these areas have inspired research towards solving more complex multi-moda

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::bbb7a2a7b0b6d810f422a05f84322c72
https://doi.org/10.1109/icip.2016.7533033

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