Zobrazeno 1 - 10
of 41
pro vyhledávání: '"Sugimoto, Aritoshi"'
Autor:
Natsuki Yokoyama, Koji Fujisaki, Yumiko Anzai, Tsutsumi Takashi, Sugimoto Aritoshi, Noriyuki Sakuma, Sonoko Migitaka, Aramaki Toru, Nobuyuki Mise, Yoshitaka Sasago, Munenori Degawa
Publikováno v:
ECS Transactions. 103:1705-1712
Solid oxide fuel cells (SOFCs), which have the highest power-generation efficiency among generators, are key in achieving a low-carbon society. To reduce the cost of an SOFC system including mounting cost, thereby, expand its application, we have bee
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c2f97f1b4f0d4572bcf38aa0e2626c08
https://doi.org/10.1149/10301.1705ecst
https://doi.org/10.1149/10301.1705ecst
Autor:
Sasago, Yoshitaka, Sakuma, Noriyuki, Yokoyama, Natsuki, Fujisaki, Koji, Anzai, Yumiko, Migitaka, Sonoko, Degawa, Munenori, Mise, Nobuyuki, Tsutsumi, Takashi, Aramaki, Toru, Sugimoto, Aritoshi
Publikováno v:
ECS Transactions; July 2021, Vol. 103 Issue: 1 p1705-1712, 8p
Publikováno v:
SPIE Proceedings.
Manufacturing integrated devices with faster clock speeds requires the fine control of three-dimensional gate structures, including line-edge roughness, sidewall angles, and sidewall structures, as well as the control of line widths. In addition, a w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::570c640d05904da66f54dfda2cb670d6
https://doi.org/10.1117/12.597269
https://doi.org/10.1117/12.597269
Publikováno v:
SPIE Proceedings.
An effective and practical control technology of critical dimensions for submicron VSLI is presented. An ARCOR (Anti-Reflective Coating On Resist) process was improved, which is applied as a transparent type anti-reflective coating. A water soluble a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5a11ea5e023fcac85119fc6cde7fe6fd
https://doi.org/10.1117/12.130317
https://doi.org/10.1117/12.130317
Autor:
Kazuya Kadota, Sadao Okano, Masayasu Tsunematsu, Kazuyuki Suko, Masahiro Nozaki, Sugimoto Aritoshi, Takeshi Kato, Tetsuo Ito
Publikováno v:
Optical/Laser Microlithography III.
New indexes to evaluate and simulate the resolution power of the UV resists based on the dissolution rate curve as it relates to local inhibitor concentration are proposed. Optical parameters and the dissolution rate curve of commercially available r
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ac4b11675dd3d11a3dcd44d386194c50
https://doi.org/10.1117/12.20218
https://doi.org/10.1117/12.20218
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 4:043007
We propose a technique using high-energy scanning electron microscope (SEM), which has the advantage of measuring 3-D structures and underlayer structures when compared to conventional low-energy SEM, to meet future metrology requirements. At first,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4ad08462dd576631a7b2cdac43f3e881
https://doi.org/10.1117/1.2073767
https://doi.org/10.1117/1.2073767
Publikováno v:
Proceedings of SPIE; Nov2006 Part 2, Issue 1, p61524O-61524O-8, 8p
Publikováno v:
Proceedings of SPIE; Nov2005, Issue 1, p798-806, 9p
Publikováno v:
Proceedings of SPIE; Nov2003, Issue 1, p50-60, 11p
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