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pro vyhledávání: '"Su-Young Chai"'
Autor:
Su-Young Chai, Sung-Hoon Choa
Publikováno v:
Crystals, Vol 13, Iss 12, p 1665 (2023)
Plasma doping (PLAD) technology is widely used in the semiconductor industry. One of the problems associated with PLAD is precise dosage control and monitoring during the doping process. Excessive boron doping into the n-type poly gate will affect th
Externí odkaz:
https://doaj.org/article/fcd5b0cdca4542a99bc3d1bae7676bd1
Autor:
Su-Young Chai, Sung-Hoon Choa
Publikováno v:
Crystals, Vol 11, Iss 9, p 1106 (2021)
Recently, the demand of a high resolution complementary metal-oxide semiconductor (CMOS) image sensor is dramatically increasing. As the pixel size reduces to submicron, however, the quality of the sensor image decreases. In particular, the dark curr
Externí odkaz:
https://doaj.org/article/6c88219339304b96a91c63ee6fcfc113