Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Stuart Gough"'
Autor:
Charles Crawford, Stuart Gough, Frank Sundermann, Carlo Pogliani, Félix Dufaye, Hiroyuki Miyashita, Astrid Sippel, Christophe Brochard, Edgardo García-Berríos, Mark Wylie, Luca Sartelli, Carl Hess
Publikováno v:
SPIE Proceedings.
193nm binary photomasks are still used in the semiconductor industry for the lithography of some critical layers for the nodes 90nm and 65nm, with high volumes and over long periods. However, these 193nm binary photomasks can be impacted by a phenome
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::078d2e2d948fe0a0b123bc0840ef1f8b
https://doi.org/10.1117/12.2029470
https://doi.org/10.1117/12.2029470
Autor:
J. Hamonne, O. Chaix-Pluchery, Laurent Dussault, P. Sergent, Stuart Gough, F. Dufaye, Bernard Pelissier, M. Tissier
Publikováno v:
Microelectronic Engineering
Microelectronic Engineering, Elsevier, 2013, 104, pp.120-129
Microelectronic Engineering, 2013, 104, pp.120-129
Microelectronic Engineering, Elsevier, 2013, 104, pp.120-129
Microelectronic Engineering, 2013, 104, pp.120-129
The aim of this study is to determine the different types of haze contamination that occur in industrial conditions, using direct physico-chemical analyses on full 6'' masks leaving their pellicle intact. Contaminated masks coming from end users (ST
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c42f200bcd15f029ffb41deb15bc6e1b
https://hal.archives-ouvertes.fr/hal-00949974
https://hal.archives-ouvertes.fr/hal-00949974
Autor:
Christophe Brochard, Carlo Pogliani, Nicolas Thivolle, Luca Sartelli, Stuart Gough, Félix Dufaye, Hiroyuki Miyashita, Yoshioka Hidenori, Frank Sundermann, Nathalie Charras
Publikováno v:
SPIE Proceedings.
193nm binary photomasks are still used in the semiconductor industry for the lithography of some critical layers for the nodes 90nm and 65nm, with high volumes and over long period. These 193nm binary masks seem to be well-known but recent studies ha
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4159d5bbe300c2e6b455bdf093bf6b51
https://doi.org/10.1117/12.898867
https://doi.org/10.1117/12.898867
Autor:
M. Tissier, P. Sergent, O. Chaix-Pluchery, J. Hamonne, F. Dufaye, Stuart Gough, Laurent Dussault, Bernard Pelissier
Publikováno v:
EMLC 2011
EMLC 2011, 2011, Germany
EMLC 2011, 2011, Germany
The aim of this study is to determine the different types of haze contamination that occur in industrial conditions, using direct physico-chemical analyses on full 6" masks leaving their pellicle intact. Contaminated masks coming from end users (ST -
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2f553882ae63f8bb4a3b77952def20a0
https://hal.science/hal-00629264
https://hal.science/hal-00629264
Autor:
Félix Dufaye, Hiroyuki Miyashita, Vincent Farys, L. Sartelli, Robert Birkner, F. Perissinotti, Stuart Gough, Ute Buttgereit, Sascha Perlitz, Frank Sundermann
Publikováno v:
SPIE Proceedings.
In microelectronic industry, mainly from the 65nm node, phase shift photomasks (PSM) are increasingly used for critical layers, optical properties of the shifter (MoSi) giving a better control of critical dimensions (CD) in photoresist. Fabusers and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8ee723a6be3d91a00f85b076290475f6
https://doi.org/10.1117/12.863147
https://doi.org/10.1117/12.863147
Autor:
F. Perissinotti, Félix Dufaye, Hiroyuki Miyashita, Hung-Chieh Chung, Luca Sartelli, Sonia Tourniol, Yu-Chang Liu, Frank Sundermann, Ming-Chien Chiu, Stuart Gough
Publikováno v:
SPIE Proceedings.
With the optimization of sulfate-free cleaning the issue of haze under pellicle was almost eliminated. In consequence, current reasons for mask repelliclization needs are moving from pattern issues to more gross problems on back glass. Moreover, the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b2ef9a1bcc4b826a41a569c7807b7979
https://doi.org/10.1117/12.830718
https://doi.org/10.1117/12.830718
Autor:
Magali Davenet, P. Nesladek, E. Foca, S. HadjRabah, Jean-Marie Foray, Arnaud Favre, M. Tissier, P. Sergent, E. Veran, J. Palisson, F. Dufaye, V. Baudiquez, Bertrand Bellet, S. Gopalakrishnan, I. Hollein, Stuart Gough
Publikováno v:
25th European Mask and Lithography Conference.
Within the frame of the European R&D project the so called "HYMNE" project, lead by STM, advanced vacuum decontamination processes had been demonstrated to be efficient on wafer substrates in order to remove airborne molecular contamination (moisture
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::938fe03ac620be6e34c2de502fcd31ea
https://doi.org/10.1117/12.835172
https://doi.org/10.1117/12.835172
Autor:
D. Cheung, C. Rude, V. Baudiquez, Arnaud Favre, E. Foca, Magali Davenet, F. Dufaye, J. Palisson, Jean Marie Foray, S. Gopalakrishnan, Stuart Gough, I. Hollein, P. Richteiger, K. Avary, P. Nesladek
Publikováno v:
25th European Mask and Lithography Conference.
Contamination and especially Airbone Molecular Contamination (AMC) is a critical issue for mask material flow with a severe and fairly unpredictable risk of induced contamination and damages especially for 193 nm lithography. It is therefore essentia
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::58ab753da81fdb6d9ec815ec63983c91
https://doi.org/10.1117/12.835198
https://doi.org/10.1117/12.835198
Autor:
Luca Sartelli, Félix Dufaye, Stuart Gough, Hiroyuki Miyashita, Astrid Sippel, Frank Sundermann, Ernesto Villa
Publikováno v:
25th European Mask and Lithography Conference.
The paper describes a new approach of evaluating isolated opaque defects, as well as CD-like defects on hole layer, using features available on the inspection tool. This eliminates further verifications on specific tools, which would result in their
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::05f7e93f6749d31bf1477b543ae1d6c7
https://doi.org/10.1117/12.835191
https://doi.org/10.1117/12.835191
Autor:
D. Cheung, Magali Davenet, H. Fontaine, K. Avary, Patrice Dejaune, T. Trautmann, Arnaud Favre, C. Rude, Stuart Gough, R. Lerit, Michel Tissier, M. Veillerot, Jean Marie Foray, I. Hollein, Pierre Sergent
Publikováno v:
SPIE Proceedings.
Context/ study Motivation: Contamination and especially Airbone Molecular Contamination (AMC) is a critical issue for mask material flow with a severe and fairly unpredictable risk of induced contamination and damages especially for 193 nm lithograph
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::40704aa4df7734b632b3cdf26f8e51d7
https://doi.org/10.1117/12.798586
https://doi.org/10.1117/12.798586