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Publikováno v:
In Microelectronic Engineering October 2013 110:60-65
Publikováno v:
In Chemical Physics Letters 12 November 2012 552:122-125
Autor:
Bekman, H.H.P.T., Dekker, M.F., Ebeling, R.P., Janssen, J.P.B., Koster, N.B., Meijlink, J.R., Molkenboer, F.T., Nicolai, K., Putten, M. van, Rijnsent, C.G.J., Storm, A.J., Stortelder, J.K., Wu, C.C., Zanger, R.M.S. de
Publikováno v:
Proceedings International Conference on Extreme Ultraviolet Lithography 2019, SPIE Photomask Technology + EUV Lithography, 2019, Monterey, CA, USA, 11147
Adoption of EUV lithography for high-volume production is accelerating. TNO has been involved in lifetime studies from the beginning of the EUV alpha demo tools. One of the facilities for these studies is the EUV Beam Line (EBL1) designed and install
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Publikováno v:
Goldberg, K.A., Proceedings Extreme Ultraviolet (EUV) Lithography X 2019, 25-28 February 2019, San Jose, CA, USA
Novel absorber materials are being developed to improve EUV-reticle imaging performance for the next generations of EUV lithography tools. TNO, together with ASML, has developed a compatibility assessment for novel absorber materials, which addresses
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Publikováno v:
Journal of vacuum science and technology A, November/December, 37, 061302-1-061302-7
Hydrogen radicals play an important role in, e.g., the cleaning of extreme ultraviolet reflective mirrors. Therefore, there is a need to quantify the surface radical flux in the various (plasma) setups where these effects are studied. In this paper,
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Autor:
Storm, A.J.
PhD (Mechanical Engineering), North-West University, Potchefstroom Campus Coal combustion remains the major resource of power generation internationally. Coal consists of different substances, which influence its quality and properties. One such prop
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https://hdl.handle.net/10394/35626
https://hdl.handle.net/10394/35626
Akademický článek
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Publikováno v:
Applied Surface Science, 288, 673-676
Atomic hydrogen cleaning is a promising method for EUV lithography systems, to recover from surface oxidation and to remove carbon and tin contaminants. Earlier studies showed, however, that tin may redeposit on nearby surfaces due to SnH4 decomposit
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Publikováno v:
Journal of Vacuum Science & Technology A, 30 (3), 2012
Journal of Vacuum Science Technology A, January/February, 3, 30, 031603-1-031603-6
Journal of Vacuum Science Technology A, January/February, 3, 30, 031603-1-031603-6
An isothermal sensor is developed to quantify the atomic hydrogen flux on a surface, which can be located at any distance from the molecular hydrogen cracking unit. This flux is determined from the measured heat effect due to recombination of atomic
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