Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Steven R. A. Van Aerde"'
Autor:
Bart Bozon, Steven R. A. Van Aerde, Min Yan, Matthias Bauer, Wilco Verweij, Peter Zagwijn, Ed Oosterlaken, Pamela R. Fischer
Publikováno v:
ECS Transactions. 3:203-215
The deposition and film properties for Silcore®-based silicon film deposition, both undoped and doped, are discussed for two different hardware configurations, a vertical furnace and a single wafer reactor. Silcore chemistry provides an alternative
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::715d2c084534c2e2024ac3de391e80f7
https://doi.org/10.1149/1.2356280
https://doi.org/10.1149/1.2356280
Autor:
J. M. Mora-Gutiérrez, A. Ragel-Morales, Jose Maria Munoz-Hinojosa, Agnes Verbist, Bert Du Bois, Steven R. A. Van Aerde, A. Mehta, Ann Witvrouw, J. Ramos-Martos, Christina Leinenbach, Jorg Spengler, M. A. Lagos-Florido, J. Ceballos-Cáceres, Alberto Arias-Drake, Kersten Kehr
Publikováno v:
SPIE Proceedings.
Fabrication of surface-micromachined structures by a post-processing module above standard IC circuits is an efficient way to produce monolithic microsystems, allowing nearly independent optimization of the circuitry and the MEMS process. However, un
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5a29d9553a3bf3e5c27a83fdc3fd8413
https://doi.org/10.1117/12.608499
https://doi.org/10.1117/12.608499