Zobrazeno 1 - 10
of 21
pro vyhledávání: '"Steven J. Haney"'
Autor:
Obert R. Wood, William C. Sweatt, Kurt W. Berger, W. K. Waskiewicz, Daniel A. Tichenor, Donald Lawrence White, Richard H. Stulen, Richard R. Freeman, Marc D. Himel, David L. Windt, Jeffrey Bokor, Steven J. Haney, John E. Bjorkholm, L. A. Brown, Glenn D. Kubiak, Donald M. Tennant, William M. Mansfield, Tanya E. Jewell, Alastair A. MacDowell, Michael E. Malinowski
Publikováno v:
Applied optics. 32(34)
Soft-x-ray projection imaging is demonstrated by the use of 14-nm radiation from a laser plasma source and a single-surface multilayer-coated ellipsoidal condenser. Aberrations in the condenser and the Schwarzschild imaging objective are characterize
Autor:
Donald Lawrence White, Richard R. Freeman, Donald M. Tennant, William M. Mansfield, Michael E. Malinowski, Daniel A. Tichenor, L. A. Brown, Richard H. Stulen, Steven J. Haney, Kurt W. Berger, W. K. Waskiewicz, John E. Bjorkholm, Obert R. Wood, David L. Windt, Alastair A. MacDowell, Tanya E. Jewell, Glenn D. Kubiak, Jeffrey Bokor
Publikováno v:
Optics letters. 16(20)
Projection imaging of 0.1-microm lines and spaces is demonstrated with a Mo/Si multilayer coated Schwarzschild objective and 14-nm illumination from a laser plasma source. This structure has been etched into a silicon wafer by using a trilevel resist
Autor:
Pamela K. Barr, John E. M. Goldsmith, Henry N. Chapman, Eric M. Panning, Sang Hun Lee, Louis J. Bernardez, William C. Replogle, Patrick P. Naulleau, Daniel A. Tichenor, W. P. Ballard, Stefan Wurm, Donna J. O'Connell, Karen L. Jefferson, Steven J. Haney, Terry A. Johnson, Alvin H. Leung
Publikováno v:
SPIE Proceedings.
Static and scanned images of 100nm dense features for a developmental set of l/14 optics (projection optics box # 1, POB 1) in the Engineering Test Stand (ETS) were successfully obtained with various LPP source powers last year. The ETS with POB1 has
Autor:
Karen L. Jefferson, Richard J. Anderson, Mark D. Zimmerman, Philip A. Grunow, J. Taylor, Patrick P. Naulleau, Alvin H. Leung, Pamela K. Barr, Richard H. Campiotti, E. M. Gullikson, Tony G. Smith, Leonard E. Klebanoff, Layton C. Hale, Henry N. Chapman, R. Lafon, Kenneth A. Goldberg, Sang Hun Lee, Joel R. Darnold, Yon E. Perras, William C. Replogle, Samuel Ponti, Steven J. Haney, John B. Wronosky, Terry A. Johnson, Kenneth A. Williams, Daniel A. Tichenor, Harry Shields, Therese L. Porter, James L. Van De Vreugde, Daniel L. Knight, W. P. Ballard, Luis J. Bernardez, Donna J. O'Connell, Randall J. St. Pierre, Dean A. Buchenauer, Kenneth L. Blaedel, Samuel Graham, G. E. Sommargren
Publikováno v:
SPIE Proceedings.
Full-field imaging with a developmental projection optic box (POB 1) was successfully demonstrated in the alpha tool Engineering Test Stand (ETS) last year. Since then, numerous improvements, including laser power for the laser-produced plasma (LPP)
Autor:
Leonard E. Klebanoff, Samual Graham, Alvin H. Leung, Steven J. Haney, Philip A. Grunow, W. Miles Clift
Publikováno v:
Emerging Lithographic Technologies VI.
The EUV Engineering Test Stand (ETS) has demonstrated the printing of 100 nm resolution scanned images. This milestone was achieved with the ETS operating in an initial low-power configuration using a 40 W laser combined with a Xe cluster jet. The th
Autor:
Eric M. Gullikson, David Attwood, Donald W. Sweeney, Alvin H. Leung, Luis J. Bernardez, Guojing Zhang, William P. Ballard, Karen L. Jefferson, Patrick P. Naulleau, Eric M. Panning, Henry N. Chapman, Steven J. Haney, Terry A. Johnson, Kenneth A. Goldberg, Stefan Wurm, Daniel A. Tichenor, Pei-yang Yan, William C. Replogle, Donna J. O'Connell, John E. M. Goldsmith, Kenneth L. Blaedel, Glenn D. Kubiak, Charles W. Gwyn, John B. Wronosky, J. E. Bjorkholm, Sang Hun Lee
Publikováno v:
Emerging Lithographic Technologies VI.
Static and scanned images of 100 nm dense features were successfully obtained with a developmental set of projection optics and a 500W drive laser laser-produced-plasma (LPP) source in the Engineering Test Stand (ETS). The ETS, configured with POB1,
Autor:
W. Miles Clift, Chip Steinhaus, Leonard E. Klebanoff, Philip A. Grunow, Alvin H. Leung, Michael E. Malinowski, Steven J. Haney
Publikováno v:
SPIE Proceedings.
The first environmental data from the Engineering Test Stand (ETS) has been collected. Excellent control of high-mass hydrocarbons has been observed. This control is a result of extensive outgas testing of components and materials, vacuum compatible
Autor:
Richard H. Stulen, Yon E. Perras, Rodney P. Nissen, Daniel A. Tichenor, John E. M. Goldsmith, Gregory Frank Cardinale, Kevin D. Krenz, Daniel R. Folk, Alfred A. Ver Berkmoes, Joel R. Darnold, John B. Wronosky, Tony G. Smith, Avijit K. Ray-Chaudhuri, Craig C. Henderson, Donna J. O'Connell, Karen J. Jefferson, Glenn D. Kubiak, Kurt W. Berger, Steven J. Haney, Luis J. Bernardez, Pamela K. Barr
Publikováno v:
SPIE Proceedings.
The Sandia EUV 10x microstepper system is the result of an evolutionary development process, starting with a simple 20x system, progressing through an earlier 10x system, to the current system that has full microstepper capabilities. The 10x microste
Autor:
C. Clay Widmayer, P. A. Renard, B. Ehrlich, Steven J. Haney, D. R. Speck, David Milam, Lynn G. Seppala, John A. Caird, Bruno M. Van Wonterghem, Jerome M. Auerbach, Calvin E. Thompson, Richard A. Sacks, Mark A. Henesian, Janice K. Lawson, Timothy L. Weiland, Wade H. Williams, Paul J. Wegner, Kenneth R. Manes, I.C. Smith, J. T. Hunt, John B. Trenholme
Publikováno v:
SPIE Proceedings.
An exhaustive set of Beamlet and Nova laser system simulations were performed over a wide range of power levels in order to gain understanding about the statistical trends in Nova and Beamlet`s experimental data sets, and to provide critical validati
Autor:
Rodney P. Nissen, Obert R. Wood, Donald Lawrence White, Avijit K. Ray-Chaudhuri, Khanh B. Nguyen, Steven J. Haney, Donald M. Tennant, Richard H. Stulen, Yon E. Perras, Kurt W. Berger, Daniel A. Tichenor, Richard William Arling, Linus A. Fetter
Publikováno v:
SPIE Proceedings.
A laboratory extreme ultraviolet lithography tool (EUVL) has been assembled atSandia National Laboratories [1]. Its major components include a Schwarzschildcamera with 0.1 jim resolution integrated with a laser plasma source (LPS) and amagnetically l