Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Steven D. Golladay"'
Autor:
Takahito Nakayama, Noriaki Nakayamada, Kenji Ohtoshi, Victor Katsap, Rodney A. Kendall, Hidekazu Takekoshi, Seiichi Nakazawa, Hiroyoshi Ando, Kenichi Saito, Hideo Inoue, Tomohiro Iijima, Akihito Anpo, Yoshinori Kojima, Hirohito Anze, Rieko Nishimura, Takashi Kamikubo, Steven D. Golladay, Jun Yashima
Publikováno v:
SPIE Proceedings.
Many lithography candidates, such as ArF immersion lithography with double-patterning/double-exposure techniques, EUV lithography and nano-imprint lithography, show promising capability for 22-nm half-pitch generation lithography. ArF immersion litho
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8d42d9388e3cf893d9c60ad2918c5138
https://doi.org/10.1117/12.2065551
https://doi.org/10.1117/12.2065551
Autor:
J. D. Rockrohr, Kazuaki Suzuki, E. V. Tressler, R. J. Quickle, J. E. Lieberman, Shinichi Kojima, G. Varnell, R. S. Dhaliwal, David J. Pinckney, Werner Stickel, Takaharu Miura, Shintaro Kawata, Steven D. Golladay, Christopher F. Robinson, Hans C. Pfeiffer, Kenji Morita, Teruaki Okino, M. S. Gordon, Hiroyasu Shimizu, W. T. Novak, Takeshi Yamaguchi, M. Sogard, K. Okamoto, Akikazu Tanimoto, Samuel K. Doran, Rodney A. Kendall, Syouhei Suzuki
Publikováno v:
Microelectronic Engineering. :163-172
PREVAIL is the high throughput e-beam projection approach to NGL, which IBM is pursuing in cooperation with Nikon as alliance partner. Key lithographic building blocks of the technology have been demonstrated experimentally with a proof-of-concept (P
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f73add378015643302f32ff4c0da7df4
https://doi.org/10.1016/s0167-9317(01)00508-1
https://doi.org/10.1016/s0167-9317(01)00508-1
Autor:
Christopher F. Robinson, M. S. Gordon, R. S. Dhaliwal, Steven D. Golladay, J. E. Lieberman, J. D. Rockrohr, David J. Pinckney, William A. Enichen, Rodney A. Kendall, Hans C. Pfeiffer, E. V. Tressler, Werner Stickel
Publikováno v:
IBM Journal of Research and Development. 45:615-638
This paper is an overview of work in the IBM Microelectronics Division to extend electron-beam lithography technology to the projection level for use in next-generation lithography. The approach being explored--Projection Reduction Exposure with Vari
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5b0afdc808ab4c82d7ad8d28b3ab5fbc
https://doi.org/10.1147/rd.455.0615
https://doi.org/10.1147/rd.455.0615
Autor:
J. D. Rockrohr, R. J. Quickle, M. Sogard, Shinichi Kojima, Christopher F. Robinson, Kenji Morita, Steven D. Golladay, J. E. Lieberman, Paul Petric, David J. Pinckney, E. V. Tressler, Kazuya Okamoto, Teruaki Okino, Rodney A. Kendall, Shintaro Kawata, Hiroyasu Shimizu, Kazuaki Suzuki, W. T. Novak, Timothy R. Groves, Werner Stickel, S. C. Suziki, Samuel K. Doran, J. J. Senesi, D. P. Stumbo, G. Varnell, M. S. Gordon, R. S. Dhaliwal, Akikazu Tanimoto, Tetsutaro Yamaguchi, H. C. Pfeiffer
Publikováno v:
J. Vac. Sci. Technol. B. 17:2840-2846
Projection reduction exposure with variable axis immersion lenses (PREVAIL) represents the high throughput e-beam projection approach to NGL, which IBM is pursuing in cooperation with Nikon as alliance partner; another e-beam projection approach is S
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4eb31ae4321a8dea012421606444c8e4
http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100818145
http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100818145
Autor:
Takeshi Yamaguchi, Werner Stickel, Hiroyasu Shimizu, Takaaki Umemoto, Hans C. Pfeiffer, J. E. Lieberman, Steven D. Golladay, Rodney A. Kendall, Muneki Hamashima, Shinichi Kojima, K. Okamoto, Michael S. Gordon, James D. Rockrohr
Publikováno v:
Emerging Lithographic Technologies VI.
The PREVAIL electron optics subsystem developed by IBM has been installed at Nikon's facility in Kumagaya, Japan, for integration into the Nikon commercial EPL stepper. The cornerstone of the electron optics design is the Curvilinear Variable Axis Le
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::64c9655df0bd313ccfcd5c82e435a8ba
https://doi.org/10.1117/12.472331
https://doi.org/10.1117/12.472331
Autor:
Samuel K. Doran, J. E. Lieberman, Eileen V. Tressler, David J. Pinckney, Steven D. Golladay, Hans C. Pfeiffer, Rodney A. Kendall, R. S. Dhaliwal, Michael S. Gordon, Christopher F. Robinson, James D. Rockrohr, Werner Stickel, R. J. Quickle
Publikováno v:
SPIE Proceedings.
The IBM/Nikon alliance is continuing pursuit of an EPL stepper alpha tool based on the PREVAIL technology. This paper provides a status report of the alliance activity with particular focus on the Electron Optical Subsystem developed at IBM. We have
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2a191c525444fd471e3a2a71fb3ba3c6
https://doi.org/10.1117/12.436711
https://doi.org/10.1117/12.436711
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 20:2627
The optics of the electron projection lithography (EPL) system PREVAIL (projection reduction exposure with variable axis immersion lenses) is retraced from its conceptual and practical foundation in IBM’s shaped beam probe-forming tools via the EPL
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::72d2688dc31eba5dfffa7a6bfded1b38
https://doi.org/10.1116/1.1515303
https://doi.org/10.1116/1.1515303
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 18:3072
An overview is given of the PREVAIL Alpha system program, a joint project of IBM and Nikon to develop a production-level electron project lithography system. The Alpha system program is based on the successful completion of an initial feasibility pha
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7834835e1eb004d94795d41ff694363d
https://doi.org/10.1116/1.1314381
https://doi.org/10.1116/1.1314381
Autor:
M. S. Gordon, Werner Stickel, H. C. Pfeiffer, Christopher F. Robinson, William A. Enichen, Steven D. Golladay
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 18:3079
The curvilinear variable axis lens concept for the PREVAIL proof-of-concept (POC) system, and its practical implementation have been described in a previous publication [H. C. Pfeiffer et al., J. Vac. Sci. Technol. B 6, 2844 (1999)]. The objective of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5fb85b908fc64a2b6ff81e89e50830f5
https://doi.org/10.1116/1.1319710
https://doi.org/10.1116/1.1319710
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17:2856
In the PREVAIL proof of concept electron beam projection lithography system, 1 mm×1 mm sq reticle subfields are illuminated and imaged to a wafer with 4× demagnification. A relatively large beam semiangle (5–8 mr at the wafer) is required to opti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cae51e5aec973378441c6274b8c66667
https://doi.org/10.1116/1.591083
https://doi.org/10.1116/1.591083