Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Steven D. Golladay"'
Autor:
Takahito Nakayama, Noriaki Nakayamada, Kenji Ohtoshi, Victor Katsap, Rodney A. Kendall, Hidekazu Takekoshi, Seiichi Nakazawa, Hiroyoshi Ando, Kenichi Saito, Hideo Inoue, Tomohiro Iijima, Akihito Anpo, Yoshinori Kojima, Hirohito Anze, Rieko Nishimura, Takashi Kamikubo, Steven D. Golladay, Jun Yashima
Publikováno v:
SPIE Proceedings.
Many lithography candidates, such as ArF immersion lithography with double-patterning/double-exposure techniques, EUV lithography and nano-imprint lithography, show promising capability for 22-nm half-pitch generation lithography. ArF immersion litho
Autor:
J. D. Rockrohr, Kazuaki Suzuki, E. V. Tressler, R. J. Quickle, J. E. Lieberman, Shinichi Kojima, G. Varnell, R. S. Dhaliwal, David J. Pinckney, Werner Stickel, Takaharu Miura, Shintaro Kawata, Steven D. Golladay, Christopher F. Robinson, Hans C. Pfeiffer, Kenji Morita, Teruaki Okino, M. S. Gordon, Hiroyasu Shimizu, W. T. Novak, Takeshi Yamaguchi, M. Sogard, K. Okamoto, Akikazu Tanimoto, Samuel K. Doran, Rodney A. Kendall, Syouhei Suzuki
Publikováno v:
Microelectronic Engineering. :163-172
PREVAIL is the high throughput e-beam projection approach to NGL, which IBM is pursuing in cooperation with Nikon as alliance partner. Key lithographic building blocks of the technology have been demonstrated experimentally with a proof-of-concept (P
Autor:
Christopher F. Robinson, M. S. Gordon, R. S. Dhaliwal, Steven D. Golladay, J. E. Lieberman, J. D. Rockrohr, David J. Pinckney, William A. Enichen, Rodney A. Kendall, Hans C. Pfeiffer, E. V. Tressler, Werner Stickel
Publikováno v:
IBM Journal of Research and Development. 45:615-638
This paper is an overview of work in the IBM Microelectronics Division to extend electron-beam lithography technology to the projection level for use in next-generation lithography. The approach being explored--Projection Reduction Exposure with Vari
Autor:
J. D. Rockrohr, M. Sogard, Steven D. Golladay, Tetsutaro Yamaguchi, M. S. Gordon, Kazuaki Suzuki, Akikazu Tanimoto, Shohei Suzuki, C. A. Bohnenkamp, G. Varnell, Rodney A. Kendall, William A. Enichen, Hiroyasu Shimizu, H. C. Pfeiffer, Shinichi Kojima, W. T. Novak, J. E. Lieberman, R. S. Dhaliwal, Takaharu Miura, E. V. Tressler, Werner Stickel, Kenji Morita, Kazuya Okamoto, Shintaro Kawata, Teruaki Okino
Publikováno v:
J. Vac. Sci. Technol. B. 19:2459-2467
The IBM/Nikon alliance is developing an EPL stepper alpha tool based on the PREVAIL technology. This article provides a status report on the alliance activity with particular focus on the electron optical subsystem developed at IBM. We have previousl
Autor:
J. D. Rockrohr, R. J. Quickle, M. Sogard, Shinichi Kojima, Christopher F. Robinson, Kenji Morita, Steven D. Golladay, J. E. Lieberman, Paul Petric, David J. Pinckney, E. V. Tressler, Kazuya Okamoto, Teruaki Okino, Rodney A. Kendall, Shintaro Kawata, Hiroyasu Shimizu, Kazuaki Suzuki, W. T. Novak, Timothy R. Groves, Werner Stickel, S. C. Suziki, Samuel K. Doran, J. J. Senesi, D. P. Stumbo, G. Varnell, M. S. Gordon, R. S. Dhaliwal, Akikazu Tanimoto, Tetsutaro Yamaguchi, H. C. Pfeiffer
Publikováno v:
J. Vac. Sci. Technol. B. 17:2840-2846
Projection reduction exposure with variable axis immersion lenses (PREVAIL) represents the high throughput e-beam projection approach to NGL, which IBM is pursuing in cooperation with Nikon as alliance partner; another e-beam projection approach is S
Autor:
Munehiro Ogasawara, Steven D. Golladay, Takashi Kamikubo, Shuichi Tamamushi, Shunji Shinkawa, Shinsuke Nishimura, Rodney A. Kendall, Takahito Nakayama, Osamu Iizuka, Tetsurou Nishiyama, Rieko Nishimura, Kenji Ohtoshi, Victor Katsap
Publikováno v:
Photomask Technology 2008.
Semiconductor scaling is expected to continue to hp32nm and beyond, accompanied by explosive data volume expansion. Required minimum feature size at hp 32nm will be less than 50nm on the mask, according to ITRS2007(1). EBM 7000 is a newly designed ma
Autor:
Takeshi Yamaguchi, Werner Stickel, Hiroyasu Shimizu, Takaaki Umemoto, Hans C. Pfeiffer, J. E. Lieberman, Steven D. Golladay, Rodney A. Kendall, Muneki Hamashima, Shinichi Kojima, K. Okamoto, Michael S. Gordon, James D. Rockrohr
Publikováno v:
Emerging Lithographic Technologies VI.
The PREVAIL electron optics subsystem developed by IBM has been installed at Nikon's facility in Kumagaya, Japan, for integration into the Nikon commercial EPL stepper. The cornerstone of the electron optics design is the Curvilinear Variable Axis Le
Autor:
Samuel K. Doran, J. E. Lieberman, Eileen V. Tressler, David J. Pinckney, Steven D. Golladay, Hans C. Pfeiffer, Rodney A. Kendall, R. S. Dhaliwal, Michael S. Gordon, Christopher F. Robinson, James D. Rockrohr, Werner Stickel, R. J. Quickle
Publikováno v:
SPIE Proceedings.
The IBM/Nikon alliance is continuing pursuit of an EPL stepper alpha tool based on the PREVAIL technology. This paper provides a status report of the alliance activity with particular focus on the Electron Optical Subsystem developed at IBM. We have
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 20:2627
The optics of the electron projection lithography (EPL) system PREVAIL (projection reduction exposure with variable axis immersion lenses) is retraced from its conceptual and practical foundation in IBM’s shaped beam probe-forming tools via the EPL
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 18:3072
An overview is given of the PREVAIL Alpha system program, a joint project of IBM and Nikon to develop a production-level electron project lithography system. The Alpha system program is based on the successful completion of an initial feasibility pha