Zobrazeno 1 - 10
of 16
pro vyhledávání: '"Steven B. Herschbein"'
Publikováno v:
International Symposium for Testing and Failure Analysis.
The design and construction of a well-executed laboratory space to house high resolution analytical imaging and processing tools can often be more complex and expensive than anticipated. Unlike their manufacturing counterparts, lab tools as a class h
Autor:
Edward S. Hermann, John Carulli, Carmelo F. Scrudato, Steven B. Herschbein, Kyle M. Winter, Brian Yates
Publikováno v:
International Symposium for Testing and Failure Analysis.
Focused Ion Beam (FIB) chip circuit editing is a well-established highly specialized laboratory technique for making direct changes to the functionality of integrated circuits. A precisely tuned and placed ion beam in conjunction with process gases s
Publikováno v:
International Symposium for Testing and Failure Analysis.
Focused Ion Beam (FIB) circuit edit allows for rapid prototyping of potential semiconductor design changes without the need to run a full manufacturing cycle in a semiconductor Fab. By FIB editing a completed module, thorough testing on the bench or
Publikováno v:
International Symposium for Testing and Failure Analysis.
The Focused Ion Beam (FIB) technique of internal modification for chip repair, layout verification, and internal signal probe access has become an integral part of the process for bringing advanced products to market. The pervasive switch from wire b
Publikováno v:
International Symposium for Testing and Failure Analysis.
For most advanced semiconductor products, Focused Ion Beam (FIB) circuit modification and node access through the backside of the chip is the only viable approach. The high density of interconnect wiring and the presence of C4 solder bumping for chip
Autor:
Bing Dai, Harvey E. Berman, Steven B. Herschbein, Hyoung H. Kang, Carmelo F. Scrudato, Aaron D. Shore
Publikováno v:
International Symposium for Testing and Failure Analysis.
The presence of a full wafer dual-beam FIB on the process floor gave rise to an environment in which formerly segregated off-line lab and FAB tasks could be linked. One such idea involved a methodology for semi-automated defect targeting based on the
Autor:
Oliver D. Patterson, Steven B. Herschbein, James P. Nadeau, John F. King, Scott Edward Fuller, Hyoung H. Kang
Publikováno v:
International Symposium for Testing and Failure Analysis.
This paper introduces a high volume and fast turnaround TEM sample preparation method and requirements for a 300 mm inline DualBeam (FIB/SEM) system with “hands-off” full automation. It requires a factory automation system, robust automated recip
Autor:
Corey Senowitz, Hyoung H. Kang, Michael A. Gribelyuk, Oliver D. Patterson, Steven B. Herschbein
Publikováno v:
International Symposium for Testing and Failure Analysis.
Cross-sectional style transmission electron microscopy (TEM) sample preparation techniques by DualBeam (SEM/FIB) systems are widely used in both laboratory and manufacturing lines with either in-situ or ex-situ lift out methods. By contrast, however,
Publikováno v:
International Symposium for Testing and Failure Analysis.
Test engineers and failure analyst familiar with random access memory arrays have probably encountered the frustration of dealing with address descrambling. The resulting nonsequential internal bit cell counting scheme often means that the location o
Publikováno v:
International Symposium for Testing and Failure Analysis.
The sample preparation required for a typical backside circuit edit (CE) is a significant barrier for some labs, as it requires specific hardware and considerable operator expertise. There are also instances in which it is not possible to mechanicall