Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Steve Seiichi Miura"'
Autor:
John L. Sturtevant, Nicholas K. Eib, Kevin M. Welsh, Gary T. Spinillo, Steve Seiichi Miura, Wayne M. Moreau, James Thomas Fahey
Publikováno v:
Advances in Resist Technology and Processing XI.
The advent of deep-UV(DUV), chemically amplified, acid catalyzed photoresists as successors to positive diazoquinones photoresists has brought about a new set of process environment concerns directed towards all materials in contact or absorbed by th
Autor:
Dinesh N. Khanna, M Rahman, Nicholas K. Eib, Marina V. Plat, Stanley A. Ficner, Ralph R. Dammel, Sangya Jain, Christopher F. Lyons, William R. Brunsvold, Ping-Hung Lu, Steve Seiichi Miura, O. B. Evans
Publikováno v:
Scopus-Elsevier
The use of i-line lithography for the 16 to 64 Mbit DRAM device generations calls for increased performance of i-line resists. This paper reports on investigations on novel sensitizers for advanced i-line lithography, starting out with a discussion o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::21e5fd3f174595b7fe9057c0008f8ab9
http://www.scopus.com/inward/record.url?eid=2-s2.0-0026491460&partnerID=MN8TOARS
http://www.scopus.com/inward/record.url?eid=2-s2.0-0026491460&partnerID=MN8TOARS