Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Steve Roux"'
Publikováno v:
Emerging Digital Micromirror Device Based Systems and Applications XIII.
A frequency modulation technique is described to distinguish between particle signals and stray light in a prototype of a photolithographic mask inspection system. Strict cleanliness requirements apply to the reticles used in photolithography, and to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2c331b0a82accd75a155ba59302b8753
https://doi.org/10.1117/12.2576450
https://doi.org/10.1117/12.2576450
Autor:
Michal E. Pawlowski, Roberto B. Wiener, Ryan Munden, Peter Kochersperger, Corey Loke, Aage Bendiksen, Steve Roux
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
EUV and DUV reticles are inspected before exposure to guarantee the quality of the lithographic process. The pellicle and the reticle back side are typically inspected for the presence of contaminants which are several micrometers in diameter. While
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::83c6dde76dc9e6a9859ee2198ba7d0b9
https://doi.org/10.1117/12.2584772
https://doi.org/10.1117/12.2584772