Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Steve Rossnagel"'
Autor:
M. Guillorn, Deqiang Wang, Steve Rossnagel, Lynne Gignac, Qinghuang Lin, Sung-Wook Nam, Ajay K. Royyuru, Robert L. Bruce, Gustavo Stolovitzky, P. J. Litwinowicz, Armand Galan, Dirk Pfeiffer, Evan G. Colgan, Ronald D. Goldblatt, S. Papa Rao, J.J. Bucchignano, Markus Brink, Michael F. Lofaro, Chao Wang, W. H. Advocate, Elizabeth A. Duch, E. Kratschmer, C. M. Breslin, John M. Cotte, William Henry Price, Christopher V. Jahnes, Stas Polonsky, Hongbo Peng, Eric A. Joseph
Publikováno v:
2013 IEEE International Electron Devices Meeting.
We report sub-20 nm sacrificial nanochannels that enable stretching and translocating single DNA molecules. Sacrificial silicon nano-structures were etched with XeF2 to form nanochannels. Translocations of linearized DNA single molecules were imaged
Autor:
Binquan Luan, Hongbo Peng, Glenn J. Martyna, Steve Rossnagel, Stas Polonsky, Gustavo Stolovitzky
Publikováno v:
Physical review letters. 104(23)
The benefits of low-cost, high-throughput human genome sequencing to medical science has inspired recent experimental work focused on DNA translocation through solid-state nanopores. Given that microelectronic fabrication methods permit the integrati
Autor:
Cyril Cabral, Christian Lavoie, Lia Krusin-Elbaum, Jonathan Z. Sun, Steve Rossnagel, Kuan-Neng Chen
Publikováno v:
2006 21st IEEE Non-Volatile Semiconductor Memory Workshop.
In addition to the huge resistivity changes, the phase-change switching process is accompanied by a significant volume change (Pedersen et al., 2001), which in turn can result in large stresses. This can become a serious reliability issue, particular
Publikováno v:
IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest..
Despite many projections on the inevitable post-PVD evolution of interconnect technology, it remains PVD-based for liner-seed through 45 nm and perhaps farther, with an ALD process change the obvious next step perhaps followed by a switch from Ta to
Autor:
Steve Rossnagel, Christian Lavoie, Zhen Zhang, Ahmet S. Ozcan, Bin Yang, Shi-Li Zhang, Andrew J. Kellock, Simon Gaudet, Conal Murray, Patrick Desjardins, Jean Jordan-Sweet, Yu Zhu
Publikováno v:
Applied Physics Letters. 97:252108
This letter reports on a process scheme to obtain highly reproducible Ni1−xPtx silicide films of 3–6 nm thickness formed on a Si(100) substrate. Such ultrathin silicide films are readily attained by sputter deposition of metal films, metal stripp
Publikováno v:
Applied Physics Letters. 91:153103
We present the concept of a nanoelectromechanical device capable of controlling the position of DNA inside a nanopore with a single nucleotide accuracy. The device utilizes the interaction of discrete charges along the backbone of a DNA molecule with
Autor:
Lia Krusin-Elbaum, Matthew Copel, Steve Rossnagel, Vaughn R. Deline, Kuan-Neng Chen, Cyril Cabral, Kathleen B. Reuter, David W. Abraham, John Bruley
Publikováno v:
Applied Physics Letters. 90:141902
The authors present direct evidence for Te segregation to the grain boundaries in chalcogenide Ge2Sb2Te5 films by using transmission electron microscopy scans with a 0.5nm diameter focused probe. This finding is consistent with the observed impeded g