Zobrazeno 1 - 10
of 16
pro vyhledávání: '"Steve D. Slonaker"'
Publikováno v:
SPIE Proceedings.
This paper presents a consistent and modularized approach to modeling projection optics. Vector nature of light and polarization effect are considered from the very beginning at source, through mask and projection lens down into film stack. High-NA a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::21cfb4b08129ae31dccfefecb416735b
https://doi.org/10.1117/12.848252
https://doi.org/10.1117/12.848252
Publikováno v:
SPIE Proceedings.
As imaging requirements and limits continue to be pushed tighter and lower, it has become imperative that accurate and repeatable measurement of the projection lens (PL) pupil be readily available. These are important for setup and adjustment of the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::092e9ad34b1c547b9ea56aa2c8a78c2f
https://doi.org/10.1117/12.814333
https://doi.org/10.1117/12.814333
Autor:
Steve D. Slonaker
Publikováno v:
SPIE Proceedings.
A method has been developed for mapping and analyzing the impact of each local region of the illumination distribution (i.e. "illumination source point"). The method makes directly visible the imaging impact/result for each one of those local regions
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5f452aad8886a505018dfcd9babd3de9
https://doi.org/10.1117/12.716412
https://doi.org/10.1117/12.716412
Publikováno v:
SPIE Proceedings.
As the design rules and the actual sizes of the patterns being printed continue to shrink well below half the wavelength of light being utilized, the budgets associated with all variations in imaging likewise continue to squeeze to tighter required t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a3b2155efe894283a8fdba96f78778ce
https://doi.org/10.1117/12.659285
https://doi.org/10.1117/12.659285
Autor:
Steve D. Slonaker, Jacek K. Tyminski
Publikováno v:
SPIE Proceedings.
Integrated circuits patterning faces escalating demands challenging the fundamental constraints of the photolithography tools. The challenge is to qualify patterning tools beyond their design objectives, to extend their use for the future manufacturi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a1eb627b3bbb0f8fa0c52c220b08c8b9
https://doi.org/10.1117/12.485446
https://doi.org/10.1117/12.485446
Publikováno v:
SPIE Proceedings.
Wavefront aberrations of the projection lens are measured in many situations. The results are expressed by coefficients of Zernike polynomials that can be used as a basis for critical dimensions (CD) performance evaluation. Here we investigated sever
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::51b2863254b1ea90f526793b75a3c96a
https://doi.org/10.1117/12.485454
https://doi.org/10.1117/12.485454
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0574ecdf0edb6d2d6b3a1e9769d99364
https://doi.org/10.1117/12.485447
https://doi.org/10.1117/12.485447
Autor:
John Robert Ilzhoefer, Stephen P. Renwick, Gary Zhang, Changan Wang, David Godfrey, Colin L. Tan, Steve D. Slonaker, Chris Atkinson, Catherine H. Fruga
Publikováno v:
SPIE Proceedings.
A detailed characterization of across chip line width variation (ACLV) has been carried out on the latest Nikon scanners with a combination of advanced metrology techniques in Texas Instruments, including scatterometer-based image field and CD finger
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a44b78ff4c33cf09374e1027dfd003ca
https://doi.org/10.1117/12.485352
https://doi.org/10.1117/12.485352
Publikováno v:
SPIE Proceedings.
Flare, or unwanted light scattering, is an increasingly important phenomenon in modern lithographic lens design, operation, and testing. While it has been in the past and still frequently is characterized by a single number (“
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6aa7d0946eda6584c508df49d3862cb7
https://doi.org/10.1117/12.485441
https://doi.org/10.1117/12.485441
Publikováno v:
SPIE Proceedings.
We present a new technique for accurate and fast evaluation of lithographic imaging performance at critical dimensions (CDs) of 100 nm and below. Its advantages over traditional methods that use either SEM or electrical CD metrologies are based on tw
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d124a2ef4bdef763cd68ab56a7737925
https://doi.org/10.1117/12.473410
https://doi.org/10.1117/12.473410