Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Steve Ayres"'
Autor:
Shuhan Ding, Yiling Peng, Benyamin Davaji, Peter C. Doerschuk, Amit Lal, Jeremy Clark, Garry Bordonaro, Vincent Genova, Christopher K. Ober, Steve Ayres, Marco Heuser
Publikováno v:
2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1cd8ef724bce2ebb83af744951329ea3
https://doi.org/10.1109/asmc57536.2023.10121128
https://doi.org/10.1109/asmc57536.2023.10121128
Autor:
Benyamin Davaji, Peter A Cook, Bahar Kor, Ziwang Luo, Jiaxian Chen, Jeremy Clark, Garry Bordonaro, Vincent Genova, Marco Heuser, Steve Ayres, Christopher K Ober, Peter C Doerschuk, Amit Lal
Publikováno v:
2022 IEEE 35th International Conference on Micro Electro Mechanical Systems Conference (MEMS).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::af02d9e917277eaa472c9b9a47d9113f
https://doi.org/10.1109/mems51670.2022.9699471
https://doi.org/10.1109/mems51670.2022.9699471
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXVIII.
The continual increasing demands upon Plasma Etching systems to self-clean and continue Plasma Etching with minimal downtime allows for the examination of SiCN, SiO2 and SiN defectivity based upon Surface Scanning Inspection Systems (SSIS) wafer scan
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9f7bf5e3ded4d2be8f7162a0fb554355
https://doi.org/10.1117/12.2057401
https://doi.org/10.1117/12.2057401