Zobrazeno 1 - 10
of 331
pro vyhledávání: '"Stephen Y. Chou"'
Publikováno v:
Advanced Functional Materials. 24:6329-6339
One central challenge in LEDs is to increase light extraction; but for display applications, other factors may have equal significance, such as ambient-light absorption, contrast, viewing angle, image sharpness, brightness, and low-glare. However, cu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a4807509649d8e1ce1f1ce55b82fa3ba
https://doi.org/10.1002/adfm.201400964
https://doi.org/10.1002/adfm.201400964
Publikováno v:
Nano Letters. 14:2822-2830
We propose and experimentally demonstrate a new plasmonic nonlinear light generation (NLG) structure, termed plasmonic-enhanced, charge-assisted second-harmonic generator (p-CASH), that not only achieves high second-harmonic generation (SHG) enhancem
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fef3e444fbf147774e536f37e0c342eb
https://doi.org/10.1021/nl5008294
https://doi.org/10.1021/nl5008294
Autor:
Faheng Zang, Krishnamurthy Konduru, Liangcheng Zhou, Gerardo G. Kaplan, Zhijuan Su, Stephen Y. Chou
Publikováno v:
Advanced Materials. :1902331
Sensitive detection of pathogens is crucial for early disease diagnosis and quarantine, which is of tremendous need in controlling severe and fatal illness epidemics such as of Ebola virus (EBOV) disease. Serology assays can detect EBOV-specific anti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b1eb941e5e35a8f1df36cfc1d3983863
https://doi.org/10.1002/adma.201902331
https://doi.org/10.1002/adma.201902331
Publikováno v:
IEEE Photonics Technology Letters. 25:1707-1710
We demonstrate a new way to electrically tune the self-oscillation frequency of an external cavity VCSEL by changing the electrical current injected into the VCSEL, without using any mechanical moving parts. We found that for a self-oscillation frequ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6371522a10fedc09af28244f2933e677
https://doi.org/10.1109/lpt.2013.2273076
https://doi.org/10.1109/lpt.2013.2273076
Publikováno v:
Nano Letters. 11:5247-5251
We report a new approach, termed "growth by nanopatterned host-medicated catalyst" (NHC growth), to solve nonuniformities of Si nanowires (NWs) grown on amorphous substrates. Rather than pure metal catalyst, the NHC uses a mixture of metal catalyst w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f22017204198e36b36e9f3c04ebfee38
https://doi.org/10.1021/nl2026663
https://doi.org/10.1021/nl2026663
Publikováno v:
Small. 6:1242-1247
Typically, nanopatterning on plastic substrates has poor fidelity, poor adhesion, and low yield. Here the proposal of and the first experiment using a new fabrication method that overcomes the above obstacles and has achieved arrays of 60-nm-diameter
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5786bbfc8c9871a0ffa9bcb13bee6dbb
https://doi.org/10.1002/smll.201000104
https://doi.org/10.1002/smll.201000104
Autor:
Qiangfei Xia, Stephen Y. Chou
Publikováno v:
Applied Physics A. 98:9-59
This paper addresses novel applications of an excimer laser (308 nm wavelength, 20 ns pulse duration) in nanofabrication. Specifically, laser assisted nanoimprint lithography (LAN), self-perfection by liquefaction (SPEL), fabrication of metal nanopar
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c9971a9cc1af4a27388ddb9157e11e4b
https://doi.org/10.1007/s00339-009-5455-0
https://doi.org/10.1007/s00339-009-5455-0
Publikováno v:
Nano Letters. 8:3830-3833
We report a new method to fabricate self-enclosed optically transparent nanofluidic channel arrays with sub-10 nm channel width over large areas. Our method involves patterning nanoscale Si trenches using nanoimprint lithography (NIL), sealing the tr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5eefc4dcc929a49cc32c94917139fcbe
https://doi.org/10.1021/nl802219b
https://doi.org/10.1021/nl802219b
Publikováno v:
Nano Letters. 8:1986-1990
We report a new approach to adjust and improve nanostructures after their initial fabrication, which can reduce the trench width and hole diameter to sub-10 nm, while smoothing edge roughness and perfecting pattern shapes. In this method, termed pres
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f823ba1f3cf89603d042b7765e28eb75
https://doi.org/10.1021/nl801030c
https://doi.org/10.1021/nl801030c
Autor:
Qiangfei Xia, Stephen Y. Chou
Publikováno v:
Nature Nanotechnology. 3:295-300
A challenge in nanofabrication is to overcome the limitations of various fabrication methods, including defects, line-edge roughness and the minimum size for the feature linewidth. Here we demonstrate a new approach that can remove fabrication defect
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d2542d598ff7e23f5d43a3b85d256d39
https://doi.org/10.1038/nnano.2008.95
https://doi.org/10.1038/nnano.2008.95