Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Stephen J. DeMoor"'
Autor:
Sopa Chevacharoenkul, Patrick Reynolds, Scott Jessen, Winston Yan, Venugopal Vellanki, Jan Hauschild, Marco Pieters, Joe Ganeshan, Gary Zhang, Qizhi He, Stephen J. DeMoor
Publikováno v:
SPIE Proceedings.
The understanding of focus variation across a wafer is crucial to CD control (both ACLV and AWLV) and pattern fidelity on the wafer and chip levels. This is particularly true for the 65nm node and beyond, where focus margin is shrinking with the desi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b8d9193e4842606b9269ba8f48f3a68e
https://doi.org/10.1117/12.657752
https://doi.org/10.1117/12.657752
Autor:
Colin L. Tan, Mark A. Boehm, John Robert Ilzhoefer, Chris Atkinson, Guohong Zhang, Donis G. Flagello, Stephen J. DeMoor, Bernd Geh, Chad Wickman, Changan Wang, Steve Hansen
Publikováno v:
SPIE Proceedings.
Gate CD control is crucial to transistor fabrication for advanced technology nodes at and beyond 65 nm. ACLV (across chip linewidth variation) has been identified as a major contributor to overall CD budget for low k1 lithography. In this paper, we p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::402f08753e3f73067f3a0df36ac83e3e
https://doi.org/10.1117/12.535829
https://doi.org/10.1117/12.535829
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XVIII.
Although lithography equipment and alignment capabilities have evolved significantly since the early stepper days of the 1980’s, the techniques for generating overlay mix and match matrices have remained virtually unchanged. The underlying assumpti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1f05602b9329087a22e58f55c99abd00
https://doi.org/10.1117/12.534359
https://doi.org/10.1117/12.534359
Autor:
Mark A. Boehm, Christopher J. Raymond, Gary Zhang, Stephen J. DeMoor, Michael E. Littau, Changan Wang
Publikováno v:
SPIE Proceedings.
The ability to accurately, quickly and automatically fingerprint the lenses of advanced lithography scanners has always been a dream for lithographers. This is truly necessary to understand error sources of ACLV, especially when the optical lithograp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ed8f98881c56388ded820cbf7bdf7a9e
https://doi.org/10.1117/12.485434
https://doi.org/10.1117/12.485434
Publikováno v:
SPIE Proceedings.
As the dimensions of devices shrink and the processing of new devices gets more complex, the requirements for overlay are becoming tighter. Many process elements and previously unmodeled components now dominate the total overlay budget; such as retic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3d826dd4bdc8647f98cc2729c0c318a0
https://doi.org/10.1117/12.483662
https://doi.org/10.1117/12.483662
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