Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Stephane Durant"'
Autor:
Roel Gronheid, Paulina Rincon Delgadillo, Ryota Harukawa, Paul F. Nealey, Venkat Nagaswami, Chikashi Ito, Takemasa Miyagi, Stephane Durant, Steve R. Lange
Publikováno v:
SPIE Proceedings.
Directed Self-Assembly (DSA) is considered as a potential patterning solution for future generation devices. One of the most critical challenges for translating DSA into high volume manufacturing is to achieve low defect density in the DSA patterning
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ff6b620097a8040ef4a6fd9c4937c307
https://doi.org/10.1117/12.2046634
https://doi.org/10.1117/12.2046634
Autor:
Stephane Durant, Ryota Harukawa, Mayur Suri, Paul F. Nealey, Paulina Rincon Delgadillo, Dieter Van den Heuvel, Roel Gronheid, Andrew Cross, Venkat Nagaswami
Publikováno v:
Alternative Lithographic Technologies V.
As design rule shrinks, it is essential that the capability to detect smaller and smaller defects should improve. There is considerable effort going on in the industry to enhance Immersion Lithography using DSA for 14 nm design node and below. While
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::665298b19eb4f4fc1e189689c8db8b49
https://doi.org/10.1117/12.2011674
https://doi.org/10.1117/12.2011674
Autor:
Andrew Cross, Roel Gronheid, Paulina Rincon Delgadillo, Dieter Van den Heuvel, Venkat Nagaswami, Paul F. Nealey, Mayur Suri, Stephane Durant
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 12:031112
As design rule shrinks, it is essential that the capability to detect smaller and smaller defects should improve. There is considerable effort going on in the industry to enhance immersion lithography using directed self-assembly (DSA) for the 14-nm
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::012683c7c16b84b1013d2d2592497ab1
https://doi.org/10.1117/1.jmm.12.3.031112
https://doi.org/10.1117/1.jmm.12.3.031112