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pro vyhledávání: '"Stephan Henneck"'
Publikováno v:
2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
This paper describes a plan of tests and several results of experiments that were performed to determine whether wafers that were milled using an inline xenon (Xe) plasma focused ion beam (PFIB) could continue processing through the standard producti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9e7cea8fe37f4f92f683fe0ba81e9d6d
