Zobrazeno 1 - 10
of 246
pro vyhledávání: '"Stefan Sinzinger"'
Publikováno v:
Journal of the European Optical Society-Rapid Publications, Vol 17, Iss 1, Pp 1-13 (2021)
Abstract Polarizing beamsplitters have numerous applications in optical systems, such as systems for freeform surface metrology. They are classically manufactured from birefringent materials or with stacks of dielectric coatings. We present a binary
Externí odkaz:
https://doaj.org/article/1ebbcbc449194b87b51fbb29a632a292
Autor:
Thomas Handte, Nicolas Scheller, Lars Dittrich, Manuel W. Thesen, Martin Messerschmidt, Stefan Sinzinger
Publikováno v:
Micro and Nano Engineering, Vol 14, Iss , Pp 100106- (2022)
In this contribution we introduce new multilayer (bilayer and trilayer) resist systems for the generation of nanostructures with high aspect ratios of up to 14:1 on 4-in. full wafer scale. The bilayer stack consists of a bottom resist layer (lift off
Externí odkaz:
https://doaj.org/article/9b428cc5db3f496590bbfc3141358aa6
Publikováno v:
Journal of the European Optical Society-Rapid Publications, Vol 15, Iss 1, Pp 1-10 (2019)
Abstract Background Classical zoom lenses are based on movements of sub-modules along the optical axis. Generally, a constant image plane position requires at least one nonlinear sub-module movement. This nonlinearity poses a challenge for the mechan
Externí odkaz:
https://doaj.org/article/7957874800254eb681d8f4172e392fc5
Publikováno v:
Physical Review Research, Vol 1, Iss 3, p 033171 (2019)
Optical microdisk cavities with certain asymmetric shapes are known to possess unidirectional far-field emission properties. Here, we investigate arrays of these dielectric microresonators with respect to their emission properties resulting from the
Externí odkaz:
https://doaj.org/article/6e52b861a6a54fb885140972e87eb8ce
Autor:
Phuong-Ha Cu-Nguyen, Adrian Grewe, Patrik Feßer, Andreas Seifert, Stefan Sinzinger, Hans Zappe
Publikováno v:
Light: Science & Applications, Vol 5, Iss 4, Pp e16058-e16058 (2015)
Abstract We present the design, fabrication and characterization of hydraulically-tunable hyperchromatic lenses for two-dimensional (2D) spectrally-resolved spectral imaging. These hyperchromatic lenses, consisting of a positive diffractive lens and
Externí odkaz:
https://doaj.org/article/ceebf063d0834f4a8b61d51de34aec32
Autor:
Leonhard Lenk, Stefan Sinzinger
Publikováno v:
Optical Engineering. 62
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ca597a1bf0fd1bf412f8889dba385609
https://doi.org/10.1117/1.oe.62.3.035103
https://doi.org/10.1117/1.oe.62.3.035103
Publikováno v:
2022 IEEE Photonics Conference (IPC).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6b9ec14789bab92ce81c3114f2ca7adb
https://doi.org/10.1109/ipc53466.2022.9975596
https://doi.org/10.1109/ipc53466.2022.9975596
Autor:
Arne Behrens, Stefan Sinzinger
Publikováno v:
2022 IEEE Photonics Conference (IPC).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::18bb9aeaefed81d4712a532aa251b8fb
https://doi.org/10.1109/ipc53466.2022.9975695
https://doi.org/10.1109/ipc53466.2022.9975695
Autor:
Ralf Schienbein, Florian Fern, Stefan Sinzinger, Shraddha Supreeti, Patrick Feßer, Martin Hoffmann
Publikováno v:
Nanomanufacturing and Metrology. 4:175-180
Uniform molding and demolding of structures on highly curved surfaces through conformal contact is a crucial yet often-overlooked aspect of nanoimprint lithography (NIL). This study describes the development of a NIL tool and its integration into a n
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f60de4926dae9b6f0feb2b7462a0492b
https://doi.org/10.1007/s41871-021-00114-6
https://doi.org/10.1007/s41871-021-00114-6
Autor:
Oliver Dannberg, Andreas Meister, Stephan Gorges, Tino Hausotte, Xinrui Cao, Taras Sasiuk, Ivo W. Rangelow, Johannes Kirchner, Johann Reger, Laura Mohr-Weidenfeller, Christoph Reuter, Stefan Sinzinger, Lena Zentner, Steffen Strehle, Roland Füßl, Eberhard Manske, Jaqueline Stauffenberg, Martin Hofmann, David Fischer, Ralf Schienbein, René Theska, Carsten Reinhardt, Shraddha Supreeti, Florian Fern, Thomas Fröhlich, Christoph Weise, Christoph Dr. Schäffel, Jens-Peter Zöllner, Ingo Ortlepp
Publikováno v:
Nanomanufacturing and Metrology. 4:132-148
The field of optical lithography is subject to intense research and has gained enormous improvement. However, the effort necessary for creating structures at the size of 20 nm and below is considerable using conventional technologies. This effort and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a5d9ced3f7ff818a334a8e047dd61d2a
https://doi.org/10.1007/s41871-021-00110-w
https://doi.org/10.1007/s41871-021-00110-w